Known targets — ChEMBL curated mechanism
ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG
The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 1/20 | 0.50 |
| ▸ | APOBEC3A | P31941 | 1/20 | 0.43 |
| ▸ | APOBEC3G | Q9HC16 | 1/20 | 0.43 |
| ▸ | SCN1A | P35498 | 2/20 | 0.42 |
| ▸ | SCN2A | Q99250 | 2/20 | 0.42 |
| ▸ | SCN3A | Q9NY46 | 2/20 | 0.42 |
| ▸ | DPP4 | P27487 | 2/20 | 0.39 |
| ▸ | F2 | P00734 | 1/20 | 0.39 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | TAAR1 | Q96RJ0 | 3/20 | 0.37 |
| ▸ | HTR2A | P28223 | 2/20 | 0.37 |
| ▸ | HRH1 | P35367 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.37 |
| ▸ | ADRA2A | P08913 | 1/20 | 0.36 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1618600 | 0.97 | CYP1A2 (0.52) | CYP1A2APOBEC3AAPOBEC3GSCN1ASCN2A | |
| Hydrochloric Acid SCHEMBL9420654 | 0.94 | CYP1A2 (0.50) | CYP1A2APOBEC3AAPOBEC3GSCN1ASCN2A | |
| Water SCHEMBL3329824 | 0.94 | CYP1A2 (0.50) | CYP1A2APOBEC3AAPOBEC3GSCN1ASCN2A | |
| Iodide SCHEMBL10961531 | 0.76 | APOBEC3A (0.42) | APOBEC3AAPOBEC3GSCN1ASCN2ASCN3A | |
| SCHEMBL25261916 | 0.74 | APOBEC3A (0.46) | CYP1A2APOBEC3AAPOBEC3GSCN1ASCN2A | |
| SCHEMBL3384297 | 0.72 | TAAR1 (0.42) | SCN1ASCN2ASCN3ADPP4F2 | |
| SCHEMBL3414483 | 0.72 | TAAR1 (0.42) | SCN1ASCN2ASCN3ADPP4F2 | |
| Iodide SCHEMBL14244499 | 0.70 | SCN1A (0.37) | CYP1A2APOBEC3AAPOBEC3GSCN1ASCN2A | |
| SCHEMBL31648921 | 0.70 | SRC (0.50) | LMNA | |
| SCHEMBL2987510 | 0.70 | DPP4 (0.38) | CYP1A2APOBEC3AAPOBEC3GSCN1ASCN2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20100078598-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2010-04-01 | — | — | US | claimed |
| WO-2008091135-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2008-07-31 | — | — | WO | claimed |
| US-12300507-B2 | Method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-05-13 | — | — | US | disclosed |
| US-12112979-B2 | Semiconductor device and manufacturing method thereof | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-10-08 | — | — | US | disclosed |
| US-20240186148-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-06-06 | — | — | US | disclosed |
| US-11935757-B2 | Method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2024-03-19 | — | — | US | disclosed |
| US-20230245900-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2023-08-03 | — | — | US | disclosed |
| US-11626293-B2 | Method of manufacturing a semiconductor device | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2023-04-11 | — | — | US | disclosed |
| US-20220301927-A1 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-09-22 | — | — | US | disclosed |
| US-20220230889-A1 | METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2022-07-21 | — | — | US | disclosed |
| US-11355388-B2 | Semiconductor device and manufacturing method thereof | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2022-06-07 | — | — | US | disclosed |
| US-20100078598-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2010-04-01 | — | — | US | disclosed |
| WO-2008091135-A1 | CONDUCTIVE POLYMER COMPOSITION FOR RADIOGRAPHIC IMAGING | ELPANI CO., LTD. (KR) | 2008-07-31 | — | — | WO | disclosed |
| US-20080153991-A1 | Method of making carbon nanotube patterned film or carbon nanotube composite using carbon nanotubes surface-modified with polymerizable moieties | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-06-26 | — | — | US | disclosed |
| US-20080020317-A1 | Novel metal nanoparticle and formation of conductive pattern using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2008-01-24 | — | — | US | disclosed |
| CN-100339766-C | Preparations of carbon nano tube layout film or composite material from polymerisable semgental surface modified carbon nano tubes | SAMSUNG ELECTRONICS CO LTD (KR) | 2007-09-26 | — | — | CN | disclosed |
| US-7229747-B2 | Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; heat curing; negative patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2007-06-12 | — | — | US | disclosed |
| US-20040265755-A1 | Surface treatment of interpenetrating polymer networkcarbon tubes; photolithography; heat curing; negative patterns | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2004-12-30 | — | — | US | disclosed |
| EP-1457821-A1 | Method of making carbon nanotube patterned film or carbon nanotube composite material using a composition comprising carbon nanotubes surface-modified with polymerizable moieties | Samsung Electronics Co., Ltd. (KR) | 2004-09-15 | — | — | EP | disclosed |
| US-20030064307-A1 | Process for forming latent image, process for detecting latent image, process and device for exposure, exposure apparatus, resist and substrate | NIKON CORPORATION (JP) | 2003-04-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080153991-A1 | Method of making carbon nanotube patterned film or carbon nanotube composite using carbon nanotubes surface-modified with polymerizable moieties | FSCN1, NCDN, ACTN1 | CYP1A2 902/4885APOBEC3A 3290/4885APOBEC3G 3051/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.