SCHEMBL1618565

SCHEMBL1618565

CNC(=S)C#N

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18963015 0.65
SCHEMBL10299490 0.65 MCL1 (0.41)
SCHEMBL11094030 0.63
SCHEMBL5036086 0.62
SCHEMBL529495 0.62
Dimethylamine SCHEMBL27641365 0.60
SCHEMBL10110401 0.60
SCHEMBL7775548 0.60
Water SCHEMBL6988839 0.60 ALDH1A1 (0.47)
Water SCHEMBL6988845 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7923110-B2 Metal nanoparticle having a self-assembled monolayer on its surface, and formation of conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-04-12 US claimed
US-20080020317-A1 Novel metal nanoparticle and formation of conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-01-24 US claimed
US-20080003363-A1 Novel metal nanoparticle and method for formation of conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-01-03 US claimed
EP-0743574-B1 Migration imaging members XEROX CORP (US) 2000-12-27 EP claimed
EP-0743573-B1 Method for obtaining image contrast migration imaging members XEROX CORP (US) 2000-09-06 EP claimed
EP-0743574-A2 Migration imaging members XEROX CORPORATION (US) 1996-11-20 EP claimed
EP-0743573-A2 Method for obtaining image contrast migration imaging members XEROX CORPORATION (US) 1996-11-20 EP claimed
US-5563014-A SOFTENABLE LAYER CONTAINIG PHOTOSENSITIVE MARKING MATERIAL; TRANSPARENTIZING AGENT XEROX CORPORATION (US) 1996-10-08 US claimed
US-5514505-A SELECTIVE TRANSPARENTIZATION OF PHOTOSENSITIVE MIGRATION MARKING PARTICLES EMBEDDED NEAR THE SURFACE OF A SOFTENABLE LAYER SUPPORTED BY AN ELECTROCONDUCTIVE SUBSTRATE XEROX CORPORATION (US) 1996-05-07 US claimed
US-8481161-B2 Functionalized metal nanoparticle and method for formation of conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2013-07-09 US disclosed
US-7923110-B2 Metal nanoparticle having a self-assembled monolayer on its surface, and formation of conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-04-12 US disclosed
US-20080020317-A1 Novel metal nanoparticle and formation of conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-01-24 US disclosed
US-20080003363-A1 Novel metal nanoparticle and method for formation of conductive pattern using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-01-03 US disclosed
EP-0743574-B1 Migration imaging members XEROX CORP (US) 2000-12-27 EP disclosed
EP-0743573-B1 Method for obtaining image contrast migration imaging members XEROX CORP (US) 2000-09-06 EP disclosed
EP-0743574-A2 Migration imaging members XEROX CORPORATION (US) 1996-11-20 EP disclosed
EP-0743573-A2 Method for obtaining image contrast migration imaging members XEROX CORPORATION (US) 1996-11-20 EP disclosed
US-5563014-A SOFTENABLE LAYER CONTAINIG PHOTOSENSITIVE MARKING MATERIAL; TRANSPARENTIZING AGENT XEROX CORPORATION (US) 1996-10-08 US disclosed
US-5514505-A SELECTIVE TRANSPARENTIZATION OF PHOTOSENSITIVE MIGRATION MARKING PARTICLES EMBEDDED NEAR THE SURFACE OF A SOFTENABLE LAYER SUPPORTED BY AN ELECTROCONDUCTIVE SUBSTRATE XEROX CORPORATION (US) 1996-05-07 US disclosed