SCHEMBL16205276

SCHEMBL16205276

CCC(C)COC(C(F)(F)F)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20259450 0.87
SCHEMBL25070900 0.80
SCHEMBL13349789 0.80
SCHEMBL22432489 0.80
SCHEMBL19803151 0.79 MAPK1 (0.30)
SCHEMBL14188994 0.79 MAPK1 (0.30)
SCHEMBL16015886 0.78 MAPK1 (0.32)
SCHEMBL13676831 0.77 ALDH1A1 (0.31)
SCHEMBL12290659 0.76
SCHEMBL12298401 0.76 MEN1 (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200326624-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD OF FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-15 US disclosed
US-9617359-B2 Perflouoro-t-butoxy allyl and propargyl ethers CITY UNIVERSITY OF HONG KONG (HK) 2017-04-11 US disclosed
US-20140323672-A1 PERFLOUORO-t-BUTOXY ALLYL AND PROPARGYL ETHERS CITY UNIVERSITY OF HONG KONG 2014-10-30 US disclosed