SCHEMBL16211115

SCHEMBL16211115

CC(C)(C)c1cc(Oc2ccc(C(=O)O)c(C(=O)O)c2)ccc1C1(c2ccc(Oc3ccc(C(=O)O)c(C(=O)O)c3)cc2C(C)(C)C)c2ccccc2-c2ccccc21

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.47
TDP1 Q9NUW8 4/20 0.40
DUSP3 P51452 1/20 0.40
PTPN5 P54829 1/20 0.40
PTPN11 Q06124 1/20 0.40
ALDH1A1 P00352 1/20 0.40
HPSE Q9Y251 1/20 0.39
LMNA P02545 1/20 0.39
PDK2 Q15119 4/20 0.39
GALK1 P51570 1/20 0.38
CASP6 P55212 1/20 0.38
MCL1 Q07820 1/20 0.38
PLEC Q15149 1/20 0.38
PYGM P11217 3/20 0.37
PYGL P06737 2/20 0.37
ESRRA P11474 1/20 0.37
KDM4E B2RXH2 1/20 0.35
MAPK1 P28482 1/20 0.35
GFER P55789 1/20 0.35
XDH P47989 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16210096 0.84 POLB (0.50) POLBTDP1DUSP3PTPN5PTPN11
SCHEMBL16211128 0.83 POLB (0.37) POLBALDH1A1LMNAPDK2PYGM
SCHEMBL16209985 0.83 POLB (0.51) POLBTDP1ALDH1A1HPSELMNA
SCHEMBL16210443 0.82 POLB (0.48) POLBTDP1DUSP3PTPN5PTPN11
SCHEMBL16211181 0.82 POLB (0.41) POLBTDP1DUSP3PTPN5PTPN11
SCHEMBL30821523 0.82 POLB (0.41) POLBTDP1DUSP3PTPN5PTPN11
SCHEMBL27182112 0.81 POLB (0.50) POLBTDP1ALDH1A1HPSELMNA
SCHEMBL2035345 0.80 POLB (0.57) POLBTDP1ALDH1A1HPSELMNA
SCHEMBL29512285 0.80 POLB (0.57) POLBTDP1ALDH1A1HPSELMNA
SCHEMBL8356549 0.80 POLB (0.50) POLBTDP1ALDH1A1HPSEGALK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118210199-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2024-06-18 CN disclosed
CN-118210200-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2024-06-18 CN disclosed
US-20240043619-A1 POLYIMIDE PRECURSOR RESIN COMPOSITION ASAHI KASEI KABUSHIKI KAISHA (JP) 2024-02-08 US disclosed
CN-117289549-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2023-12-26 CN disclosed
US-20140329941-A1 LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT HAVING THEREOF CHI MEI CORPORATION (TW) 2014-11-06 US disclosed