SCHEMBL16211181

SCHEMBL16211181

CC(C)(C)c1cc(C2(c3ccc(Oc4ccc(C(=O)O)c(C(=O)O)c4)c(C(C)(C)C)c3)c3ccccc3-c3ccccc32)ccc1Oc1ccc(C(=O)O)c(C(=O)O)c1

nearest known ligand 0.41

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.41
KDM4E B2RXH2 1/20 0.40
PYGM P11217 10/20 0.39
PYGL P06737 9/20 0.39
ESR1 P03372 1/20 0.37
ESR2 Q92731 1/20 0.37
ALDH1A1 P00352 1/20 0.36
IDO1 P14902 1/20 0.36
TDP1 Q9NUW8 3/20 0.35
DUSP3 P51452 1/20 0.35
PTPN5 P54829 1/20 0.35
PTPN11 Q06124 1/20 0.35
HPSE Q9Y251 1/20 0.34
LMNA P02545 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30821523 1.00 POLB (0.41) POLBKDM4EPYGMPYGLESR1
SCHEMBL16209977 0.85 ESR1 (0.48) POLBKDM4EPYGMPYGLESR1
SCHEMBL16210319 0.84 POLB (0.42) POLBKDM4EPYGMPYGLESR1
SCHEMBL6567667 0.83 POLB (0.43) POLBKDM4EPYGMPYGLESR1
SCHEMBL16211115 0.82 POLB (0.47) POLBKDM4EPYGMPYGLALDH1A1
SCHEMBL16211132 0.82 IDO1 (0.41) ESR1ESR2IDO1
SCHEMBL16210182 0.82 POLB (0.42) POLBKDM4EPYGMPYGLESR1
SCHEMBL2035345 0.81 POLB (0.57) POLBKDM4EPYGMPYGLESR1
SCHEMBL29512285 0.81 POLB (0.57) POLBKDM4EPYGMPYGLESR1
SCHEMBL16211126 0.80 PTPN11 (0.41) POLBKDM4EPYGMPYGLESR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118210200-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2024-06-18 CN disclosed
CN-118210199-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2024-06-18 CN disclosed
CN-117289549-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2023-12-26 CN disclosed
US-20140329941-A1 LIQUID CRYSTAL ALIGNMENT AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY ELEMENT HAVING THEREOF CHI MEI CORPORATION (TW) 2014-11-06 US disclosed