⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL896452 | 0.97 | ALDH1A1 (0.32) | — | |
| SCHEMBL895710 | 0.97 | ALDH1A1 (0.32) | — | |
| SCHEMBL28938728 | 0.97 | ALDH1A1 (0.32) | — | |
| SCHEMBL28941737 | 0.97 | ALDH1A1 (0.32) | — | |
| SCHEMBL896544 | 0.97 | ALDH1A1 (0.32) | — | |
| SCHEMBL28923872 | 0.97 | ALDH1A1 (0.32) | — | |
| SCHEMBL28628109 | 0.97 | ALDH1A1 (0.32) | — | |
| SCHEMBL28441011 | 0.97 | ALDH1A1 (0.32) | — | |
| SCHEMBL143831 | 0.84 | ALDH1A1 (0.38) | — | |
| SCHEMBL1538375 | 0.84 | ALDH1A1 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1520 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3757625-B1 | ANTI-REFLECTION FILM AND LAYERED PRODUCT FILM HAVING ANTI-REFLECTION FILM | MITSUBISHI GAS CHEMICAL CO (JP) | 2024-04-03 | — | — | EP | claimed |
| US-20240092951-A1 | PHOTO-CURABLE COMPOSITION, CURED PRODUCT THEREOF, AND DISPLAY DEVICE COMPRISING SAME | DONGJIN SEMICHEM CO., LTD. (KR) | 2024-03-21 | — | — | US | claimed |
| US-11898042-B2 | Photocurable ink composition for ink jet recording and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2024-02-13 | — | — | US | claimed |
| EP-4105285-A1 | PHOTOCURABLE INK COMPOSITION FOR INK JET RECORDING AND INK JET RECORDING METHOD | Seiko Epson Corporation (JP) | 2022-12-21 | — | — | EP | claimed |
| US-11460767-B2 | Composition for film formation, film-forming method and directed self-assembly lithography process | JSR CORPORATION (JP) | 2022-10-04 | — | — | US | claimed |
| EP-3098273-B1 | DISPERSION CONTAINING METAL OXIDE PARTICLES | NIPPON CATALYTIC CHEM IND (JP) | 2022-07-06 | — | — | EP | claimed |
| US-11236249-B2 | Method of manufacturing a conductive pattern | AGFA-GEVAERT NV (BE) | 2022-02-01 | — | — | US | claimed |
| US-20210301159-A1 | PHOTOCURABLE INK COMPOSITION FOR INK JET RECORDING AND INK JET RECORDING METHOD | SEIKO EPSON CORPORATION (JP) | 2021-09-30 | — | — | US | claimed |
| US-11118075-B2 | Photocurable ink composition for ink jet recording and ink jet recording method | SEIKO EPSON CORPORATION (JP) | 2021-09-14 | — | — | US | claimed |
| US-10934405-B2 | Synthetic polymer film whose surface has microbicidal activity, plastic product which includes synthetic polymer film, sterilization method with use of surface of synthetic polymer film, photocurable resin composition, and manufacturing method of synthetic polymer film | SHARP KABUSHIKI KAISHA (JP) | 2021-03-02 | — | — | US | claimed |
| EP-2543707-A1 | Photocurable ink composition for ink jet recording and ink jet recording method | Seiko Epson Corporation (JP) | 2013-01-09 | — | — | EP | claimed |
| US-20120147095-A1 | INK COMPOSITION FOR ULTRAVIOLET CURABLE INK JETS, INK JET RECORDING APPARATUS USING THE SAME, INK JET RECORDING METHOD USING THE SAME, AND INK SET | SEIKO EPSON CORPORATION (JP) | 2012-06-14 | — | — | US | claimed |
| US-20120083545-A1 | ULTRAVIOLET-CURABLE INK JET INK COMPOSITION | SEIKO EPSON CORPORATION | 2012-04-05 | — | — | US | claimed |
| WO-2011039081-A1 | UV CURABLE INKJET COMPOSITIONS FOR HIGH-DENSITY PRINT HEADS | AGFA GRAPHICS NV (BE) | 2011-04-07 | — | — | WO | claimed |
| US-20100039463-A1 | WHITE INKJET INK IMPROVED FOR DISPERSION STABILITY | AGFA GRAPHICS NV (BE) | 2010-02-18 | — | — | US | claimed |
| EP-2097265-A1 | WHITE INKJET INK IMPROVED FOR DISPERSION STABILITY | AGFA Graphics NV (BE) | 2009-09-09 | — | — | EP | claimed |
| WO-2008074548-A1 | WHITE INKJET INK IMPROVED FOR DISPERSION STABILITY | AGFA GRAPHICS NV (BE) | 2008-06-26 | — | — | WO | claimed |
| US-20070191505-A1 | Radiation-curable liquid resin composition | DSM IP ASSETS B.V. (NL) | 2007-08-16 | — | — | US | claimed |
| EP-1656430-A2 | RADIATION-CURABLE LIQUID RESIN COMPOSITION | DSM IP Assets B.V. (NL) | 2006-05-17 | — | — | EP | claimed |
| WO-2005019128-A2 | RADIATION-CURABLE LIQUID RESIN COMPOSITION | DSM IP ASSETS B.V. (NL) | 2005-03-03 | — | — | WO | claimed |