⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16217677 | 0.90 | — | — | |
| SCHEMBL16217682 | 0.79 | — | — | |
| SCHEMBL10032080 | 0.76 | — | — | |
| SCHEMBL17165008 | 0.76 | — | — | |
| SCHEMBL12032236 | 0.72 | PIK3CD (0.32) | — | |
| SCHEMBL1134091 | 0.71 | — | — | |
| SCHEMBL12993926 | 0.70 | — | — | |
| SCHEMBL8407085 | 0.70 | KDM4E (0.34) | — | |
| SCHEMBL6853326 | 0.69 | — | — | |
| SCHEMBL6851440 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9268222-B2 | Photosensitive negative resin composition, fine structure, production process of fine structure and liquid ejection head | CANON KABUSHIKI KAISHA (JP) | 2016-02-23 | — | — | US | disclosed |
| US-9028038-B2 | Liquid discharge head | CANON KABUSHIKI KAISHA (JP) | 2015-05-12 | — | — | US | disclosed |
| US-20150097892-A1 | LIQUID DISCHARGE HEAD | CANON KABUSHIKI KAISHA (JP) | 2015-04-09 | — | — | US | disclosed |
| US-20140329175-A1 | PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION, FINE STRUCTURE, PRODUCTION PROCESS OF FINE STRUCTURE AND LIQUID EJECTION HEAD | CANON KABUSHIKI KAISHA (JP) | 2014-11-06 | — | — | US | disclosed |