SCHEMBL16233176

SCHEMBL16233176

O=C(c1ccccc1)c1cc2ccc3c4c2c(c1)c(=O)c1ccc2cc(C(=O)c5ccccc5)cc(c3=O)c2c1-4

nearest known ligand 0.45

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 3/20 0.45
KMT2A Q03164 3/20 0.45
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45
ALDH1A1 P00352 3/20 0.44
ATM Q13315 1/20 0.43
TDP1 Q9NUW8 1/20 0.43
L3MBTL1 Q9Y468 1/20 0.43
SRD5A2 P31213 1/20 0.39
CNR2 P34972 5/20 0.39
CNR1 P21554 4/20 0.39
GLA P06280 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38
PBRM1 Q86U86 1/20 0.38
GABRA1 P14867 1/20 0.37
GABRB1 P18505 1/20 0.37
AKR1B1 P15121 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9718973 0.69 MEN1 (0.81) MEN1KMT2ANPC1RAB9AALDH1A1
SCHEMBL10028103 0.69 KMT2A (0.45) MEN1KMT2ANPC1RAB9AALDH1A1
SCHEMBL133982 0.69 ATM (0.84) MEN1KMT2ANPC1RAB9AALDH1A1
SCHEMBL3349765 0.69 ATM (0.84) MEN1KMT2ANPC1RAB9AALDH1A1
SCHEMBL13045507 0.69 ATM (0.84) MEN1KMT2ANPC1RAB9AALDH1A1
SCHEMBL9187666 0.69 CHEK1 (0.37) SMN1; SMN2
SCHEMBL28211179 0.68 ALDH1A1 (0.66) MEN1KMT2ANPC1RAB9AALDH1A1
SCHEMBL15200473 0.67 ATM (0.59) MEN1KMT2ARAB9AALDH1A1ATM
SCHEMBL9193851 0.67 ERN1 (0.36) KMT2A
SCHEMBL16241710 0.67 AKR1C3 (0.46) MEN1KMT2ANPC1RAB9AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9244351-B2 Composition for hardmask, method of forming patterns using the same, and semiconductor integrated circuit device including the patterns CHEIL INDUSTRIES, INC. (KR) 2016-01-26 US disclosed
US-9244351-B2 Composition for hardmask, method of forming patterns using the same, and semiconductor integrated circuit device including the patterns CHEIL INDUSTRIES, INC. (KR) 2016-01-26 US disclosed
US-20140335447-A1 COMPOSITION FOR HARDMASK, METHOD OF FORMING PATTERNS USING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS CHEIL INDUSTRIES, INC. (KR) 2014-11-13 US disclosed
US-20140335447-A1 COMPOSITION FOR HARDMASK, METHOD OF FORMING PATTERNS USING THE SAME, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERNS CHEIL INDUSTRIES, INC. (KR) 2014-11-13 US disclosed