SCHEMBL16243794

SCHEMBL16243794

CO[Si]([CH]CC=C(C)C(=O)O)(OC)OC

nearest known ligand 0.31

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
AKR1C3 P42330 1/20 0.31
GRIK2 Q13002 1/20 0.31
APEX1 P27695 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16243849 0.82 CD81 (0.34)
SCHEMBL16243617 0.82 GRIK2 (0.31) AKR1C3GRIK2
SCHEMBL16243588 0.82 GRIK2 (0.31) AKR1C3GRIK2
SCHEMBL16243325 0.81 GRIK2 (0.30) GRIK2
SCHEMBL16243751 0.81 GRIK2 (0.33) GRIK2
SCHEMBL6442156 0.81 GRIK2 (0.30) GRIK2
SCHEMBL16243621 0.79
SCHEMBL16243729 0.79
SCHEMBL16243757 0.75 ALDH1A1 (0.40)
SCHEMBL1774515 0.75 AKR1C3 (0.42) AKR1C3GRIK2APEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9177819-B2 Method for manufacturing silicon substrate having textured structure TOKUYAMA CORPORATION (JP) 2015-11-03 US disclosed
US-20140349485-A1 METHOD FOR MANUFACTURING SILICON SUBSTRATE HAVING TEXTURED STRUCTURE TOKUYAMA CORPORATION a corporation 2014-11-27 US disclosed