SCHEMBL16248443

SCHEMBL16248443

C=CCOCC(O)COC(=O)C(C)C

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 5/20 0.52
CA2 P00918 5/20 0.52
CA7 P43166 4/20 0.52
TDP1 Q9NUW8 1/20 0.39
CA9 Q16790 4/20 0.37
CA4 P22748 3/20 0.37
TSHR P16473 2/20 0.36
ADRB2 P07550 4/20 0.36
ADRB1 P08588 4/20 0.36
ADRB3 P13945 3/20 0.36
USP2 O75604 2/20 0.36
CYP3A4 P08684 2/20 0.36
MAPT P10636 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
ALDH1A1 P00352 1/20 0.36
HPGD P15428 1/20 0.36
CYP2D6 P10635 3/20 0.32
LMNA P02545 2/20 0.31
POLB P06746 1/20 0.31
SLC22A1 O15245 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12055819 0.85 CA1 (0.47) CA1CA2CA7TDP1CA9
SCHEMBL31587668 0.84 CA1 (0.53) CA1CA2CA7TDP1CA9
SCHEMBL1831331 0.84 CA1 (0.53) CA1CA2CA7TDP1CA9
SCHEMBL15623798 0.83 CA1 (0.49) CA1CA2CA7TDP1CA9
SCHEMBL14409121 0.82 CA1 (0.45) CA1CA2CA7TDP1CA9
SCHEMBL2735481 0.80 LMNA (0.35) TSHRADRB2ADRB1ADRB3MAPT
SCHEMBL497334 0.80 CA1 (0.74) CA1CA2CA7TDP1CA9
SCHEMBL31169247 0.80 CA1 (0.53) CA1CA2CA7TDP1CA9
SCHEMBL3410016 0.80 CA1 (0.53) CA1CA2CA7TDP1CA9
SCHEMBL967572 0.79 TSHR (0.50) CA1CA2CA7TDP1CA9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10005863-B2 Processes to form ethylene-based polymers using asymmetrical polyenes DOW GLOBAL TECHNOLOGIES LLC (US) 2018-06-26 US disclosed
US-20170335034-A1 Processes to Form Ethylene-Based Polymers Using Asymmetrical Polyenes DOW BENELUX B.V. (NL) 2017-11-23 US disclosed
US-20170335034-A1 Processes to Form Ethylene-Based Polymers Using Asymmetrical Polyenes DOW BENELUX B.V. (NL) 2017-11-23 US disclosed
US-20140338550-A1 RESIN COMPOSITION FOR LASER-ENGRAVABLE FLEXOGRAPHIC PRINTING PLATE, FLEXOGRAPHIC PRINTING PLATE PRECURSOR FOR LASER-ENGRAVABLE AND PROCESS FOR PRODUCING SAME, AND FLEXOGRAPHIC PRINTING PLATE AND PROCESS FOR MAKING SAME FUJIFILM CORPORATION (JP) 2014-11-20 US disclosed