Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | CA2 | P00918 | 2/20 | 0.39 |
| ▸ | MAPT | P10636 | 4/20 | 0.36 |
| ▸ | TP53 | P04637 | 3/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | SIGMAR1 | Q99720 | 1/20 | 0.32 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.32 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.32 |
| ▸ | XDH | P47989 | 1/20 | 0.32 |
| ▸ | POLB | P06746 | 1/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.32 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.32 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL28447947 | 0.99 | CA1 (0.38) | CA1CA2MAPTTP53LMNA | |
| Boric Acid SCHEMBL27962833 | 0.95 | CA1 (0.36) | CA1CA2MAPTTP53LMNA | |
| SCHEMBL28192748 | 0.95 | CA1 (0.36) | CA1CA2MAPTTP53LMNA | |
| SCHEMBL15901624 | 0.94 | CA1 (0.45) | CA1CA2MAPTTP53LMNA | |
| Hydrochloric Acid SCHEMBL28887613 | 0.93 | CA1 (0.44) | CA1CA2MAPTTP53LMNA | |
| Hydrochloric Acid SCHEMBL30286340 | 0.90 | MAPT (0.36) | CA1CA2MAPTTP53LMNA | |
| SCHEMBL28381347 | 0.90 | CA1 (0.42) | CA1CA2MAPTTP53LMNA | |
| SCHEMBL30731337 | 0.87 | MAPT (0.35) | CA1CA2MAPTTP53LMNA | |
| SCHEMBL19362304 | 0.86 | ALDH1A1 (0.44) | CA1CA2MAPTTP53LMNA | |
| Hydrochloric Acid SCHEMBL28977615 | 0.85 | MAPT (0.34) | CA1CA2MAPTTP53LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118173877-A | Solid polymer electrolyte, negative plate containing same, and preparation method and application thereof | 蜂巢能源科技股份有限公司 | 2024-06-11 | — | — | CN | claimed |
| CN-112934196-A | Hollow carbon sphere HCS porous liquid with flowing behavior at room temperature and preparation method thereof | 西北工业大学 | 2021-06-11 | — | — | CN | claimed |
| US-9631101-B2 | Ionic liquid release coat for use in metal flake manufacture | ECKART AMERICA CORPORATION (US) | 2017-04-25 | — | — | US | claimed |
| CN-106179498-A | Polystyrene catalysis bead and slurry photocatalytic reactor | 天津工业大学 | 2016-12-07 | — | — | CN | claimed |
| CN-104610486-A | Ionic liquid functionalized ultra-crosslinking polymer as well preparation method and application thereof | HANGZHOU REWARD TECHNOLOGY CO LTD | 2015-05-13 | — | — | CN | claimed |
| US-20140350147-A1 | IONIC LIQUID RELEASE COAT FOR USE IN METAL FLAKE MANUFACTURE | ECKART AMERICA CORPORATION (US) | 2014-11-27 | — | — | US | claimed |
| CN-103316712-B | Polypropylene catalytic film for dye degradation and preparation method thereof | UNIV TIANJIN POLYTECHNIC | 2014-11-26 | — | — | CN | claimed |
| CN-103316712-A | Polypropylene catalytic film for dye degradation and preparation method thereof | UNIV TIANJIN POLYTECHNIC | 2013-09-25 | — | — | CN | claimed |
| CN-118173877-A | Solid polymer electrolyte, negative plate containing same, and preparation method and application thereof | 蜂巢能源科技股份有限公司 | 2024-06-11 | — | — | CN | disclosed |
| CN-118173877-A | Solid polymer electrolyte, negative plate containing same, and preparation method and application thereof | 蜂巢能源科技股份有限公司 | 2024-06-11 | — | — | CN | disclosed |
| CN-117467226-B | Composition, sensing film, sensor, preparation method and application | 上海拜安传感技术有限公司 | 2024-03-19 | — | — | CN | disclosed |
| CN-117467226-A | Composition, sensing film, sensor, preparation method and application | 上海拜安传感技术有限公司 | 2024-01-30 | — | — | CN | disclosed |
| CN-114044862-B | Preparation method of chitin brush-shaped conductive elastomer material and prepared material | 安徽农业大学 | 2022-08-19 | — | — | CN | disclosed |
| CN-114044862-A | Preparation method of chitin brush-shaped conductive elastomer material and prepared material | 安徽农业大学 | 2022-02-15 | — | — | CN | disclosed |
| US-8022397-B2 | Transistor | SEIKO EPSON CORPORATION (JP) | 2011-09-20 | — | — | US | disclosed |
| US-7927913-B2 | Electrolyte pattern and method for manufacturing an electrolyte pattern | SEIKO EPSON CORPORATION (JP) | 2011-04-19 | — | — | US | disclosed |
| CN-101993418-A | (Methyl) acrylamido carboxylate ionic liquid and preparation method thereof | UNIV BEIJING NORMAL | 2011-03-30 | — | — | CN | disclosed |
| US-20090039343-A1 | Transistor | SEIKO EPSON CORPORATION (JP) | 2009-02-12 | — | — | US | disclosed |
| US-20090042346-A1 | Electrolyte pattern and method for manufacturing an electrolyte pattern | SEIKO EPSON CORPORATION (JP) | 2009-02-12 | — | — | US | disclosed |
| CN-101310152-A | Supercritical flat panel collector and methods of use | REXORCE THERMIONICS INC (US) | 2008-11-19 | — | — | CN | disclosed |