⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36723 | 0.89 | — | — | |
| Bromide SCHEMBL11261850 | 0.80 | — | — | |
| Ammonia Solution, Strong SCHEMBL8334514 | 0.80 | — | — | |
| SCHEMBL11432344 | 0.80 | — | — | |
| Water SCHEMBL9443623 | 0.80 | — | — | |
| SCHEMBL11057441 | 0.80 | — | — | |
| SCHEMBL183433 | 0.80 | — | — | |
| Bromide SCHEMBL5961728 | 0.80 | — | — | |
| Iodide SCHEMBL6928807 | 0.73 | — | — | |
| Hydrochloric Acid SCHEMBL10430971 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-105143104-B | The purification process of silane compound or chlorosilane cpd, the manufacture method of polysilicon and the regeneration treating method of weak-base ion-exchange resin | 信越化学工业株式会社 | 2018-01-02 | — | — | CN | disclosed |
| CN-104718233-A | Curable resin composition, and cured product thereof | DAICEL CORP | 2015-06-17 | — | — | CN | disclosed |
| US-20140361407-A1 | SILICON MATERIAL SUBSTRATE DOPING METHOD, STRUCTURE AND APPLICATIONS | SCHMID Group (DE) | 2014-12-11 | — | — | US | disclosed |
| CN-102776509-B | Method for repairing surface of used pyrolytic boron nitride crucible | BOYU SEMICONDUCTOR VESSEL CRAFTWORK TECHNOLOGY CO LTD | 2014-04-16 | — | — | CN | disclosed |
| CN-102776509-A | Method for repairing surface of used pyrolytic boron nitride crucible | BEIJING BOYU SEMICONDUCTOR ART & CRAFT UTENSILS TECHNOLOGY CO LTD | 2012-11-14 | — | — | CN | disclosed |
| CN-101643932-B | Low texture pyrolysis born nitride (PBN) thin-wall container and preparation method thereof | BEIJING BOYU SEMICONDUCTOR PROCESS CONTAINERS TECHNOLOGY CO LTD | 2011-07-27 | — | — | CN | disclosed |
| CN-101643932-A | Low texture pyrolysis born nitride (PBN) thin-wall container and preparation method thereof | BEIJING BOYU SEMICONDUCTOR PRO | 2010-02-10 | — | — | CN | disclosed |
| CN-1873060-A | Compound semiconductor single crystal, vessel for growing the same, and process for fabricating the same | HITACHI CABLE (JP) | 2006-12-06 | — | — | CN | disclosed |
| CN-1250779-C | Pyrolyzing borium nitride crucible and method | ADVANCED CERAMICS CORP (US) | 2006-04-12 | — | — | CN | disclosed |
| CN-1400336-A | Pyrolyzing borium nitride crucible and method | ADVANCED CERAMICS CORP (US) | 2003-03-05 | — | — | CN | disclosed |