SCHEMBL16280579

SCHEMBL16280579

Cc1cc(N)ccc1-c1ccc(N)cc1C.Cc1cc(N)ccc1-c1ccc(N)cc1C

nearest known ligand 0.65

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.65
PDE10A Q9Y233 1/20 0.56
CASP1 P29466 5/20 0.55
TSHR P16473 6/20 0.50
CYP3A4 P08684 3/20 0.50
MAPT P10636 4/20 0.48
MEN1 O00255 3/20 0.48
KMT2A Q03164 3/20 0.48
THRB P10828 2/20 0.48
GAA P10253 2/20 0.48
NR4A1 P22736 1/20 0.48
PTK2B Q14289 1/20 0.48
KDM4E B2RXH2 3/20 0.48
LMNA P02545 2/20 0.48
ALOX15 P16050 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
PLA2G7 Q13093 1/20 0.43
SMN1; SMN2 Q16637 3/20 0.43
ACHE P22303 1/20 0.43
ANPEP P15144 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30839745 1.00 ALDH1A1 (0.65) ALDH1A1PDE10ACASP1TSHRCYP3A4
SCHEMBL29777463 1.00 ALDH1A1 (0.65) ALDH1A1PDE10ACASP1TSHRCYP3A4
SCHEMBL63910 1.00 ALDH1A1 (0.65) ALDH1A1PDE10ACASP1TSHRCYP3A4
SCHEMBL29883688 0.97 ALDH1A1 (0.62) ALDH1A1PDE10ACASP1TSHRCYP3A4
Ammonia Solution, Strong SCHEMBL28188790 0.97 ALDH1A1 (0.62) ALDH1A1PDE10ACASP1TSHRCYP3A4
Hydrochloric Acid SCHEMBL866171 0.97 ALDH1A1 (0.62) ALDH1A1PDE10ACASP1TSHRCYP3A4
Hydrochloric Acid SCHEMBL4651933 0.97 ALDH1A1 (0.62) ALDH1A1PDE10ACASP1TSHRCYP3A4
Methane SCHEMBL28036179 0.97 ALDH1A1 (0.62) ALDH1A1PDE10ACASP1TSHRCYP3A4
SCHEMBL5437682 0.97 ALDH1A1 (0.62) ALDH1A1PDE10ACASP1TSHRCYP3A4
Nitrogen SCHEMBL27874102 0.95 ALDH1A1 (0.59) ALDH1A1PDE10ACASP1TSHRCYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210294213-A1 NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING POLYIMIDE AND CURED RELIEF PATTERN USING SAME ASAHI KASEI KABUSHIKI KAISHA (JP) 2021-09-23 US disclosed
EP-3859447-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE FUJIFILM Corporation (JP) 2021-08-04 EP disclosed
US-20140363760-A1 POLYCARBONATE COPOLYMER, AND COATING LIQUID AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY USING SAME IDEMITSU KOSAN CO., LTD. (JP) 2014-12-11 US disclosed