Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC2 | Q92769 | 4/20 | 0.57 |
| ▸ | HDAC4 | P56524 | 2/20 | 0.57 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.57 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.57 |
| ▸ | HDAC1 | Q13547 | 3/20 | 0.48 |
| ▸ | HDAC3 | O15379 | 2/20 | 0.48 |
| ▸ | HDAC7 | Q8WUI4 | 1/20 | 0.48 |
| ▸ | HDAC5 | Q9UQL6 | 1/20 | 0.48 |
| ▸ | CTSK | P43235 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 3/20 | 0.43 |
| ▸ | SLC6A1 | P30531 | 1/20 | 0.43 |
| ▸ | SLC6A13 | Q9NSD5 | 1/20 | 0.43 |
| ▸ | GABRP | O00591 | 1/20 | 0.43 |
| ▸ | GABRD | O14764 | 1/20 | 0.43 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.43 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.43 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.43 |
| ▸ | GABRR1 | P24046 | 1/20 | 0.43 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.43 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL518451 | 1.00 | HDAC2 (0.57) | HDAC2HDAC4HDAC8HDAC6HDAC1 | |
| SCHEMBL19359633 | 1.00 | HDAC2 (0.57) | HDAC2HDAC4HDAC8HDAC6HDAC1 | |
| SCHEMBL1478673 | 1.00 | HDAC2 (0.57) | HDAC2HDAC4HDAC8HDAC6HDAC1 | |
| SCHEMBL30490816 | 1.00 | HDAC2 (0.57) | HDAC2HDAC4HDAC8HDAC6HDAC1 | |
| SCHEMBL518453 | 1.00 | HDAC2 (0.57) | HDAC2HDAC4HDAC8HDAC6HDAC1 | |
| SCHEMBL6885892 | 1.00 | HDAC2 (0.57) | HDAC2HDAC4HDAC8HDAC6HDAC1 | |
| SCHEMBL20184157 | 1.00 | HDAC2 (0.57) | HDAC2HDAC4HDAC8HDAC6HDAC1 | |
| SCHEMBL11169389 | 1.00 | HDAC2 (0.57) | HDAC2HDAC4HDAC8HDAC6HDAC1 | |
| SCHEMBL11169395 | 1.00 | HDAC2 (0.57) | HDAC2HDAC4HDAC8HDAC6HDAC1 | |
| SCHEMBL28247735 | 1.00 | HDAC2 (0.57) | HDAC2HDAC4HDAC8HDAC6HDAC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3713989-B1 | HIGH MOLECULAR WEIGHT POLYOXYETHYLENE WITH DEEP GLASS TEMPERATURE MADE USING THE GRAFTING THROUGH METHOD | COVESTRO INTELLECTUAL PROPERTY GMBH & CO KG (DE) | 2021-06-30 | — | — | EP | claimed |
| US-20200377652-A1 | HIGH MOLECULAR WEIGHT POLYOXYALKYLENE WITH LOW GLASS TRANSITION TEMPERATURE, PRODUCED BY THE GRAFTING THROUGH METHOD | COVESTRO DEUTSCHLAND AG (DE) | 2020-12-03 | — | — | US | claimed |
| EP-3357903-B1 | METHOD FOR A CONTINUOUS PRODUCTION OF A Z-CYCLOOCTENE | STICHTING KATHOLIEKE UNIV (NL) | 2020-11-04 | — | — | EP | claimed |
| EP-3713989-A1 | HIGH MOLECULAR WEIGHT POLYOXYALKYLENE WITH LOW GLASS TRANSITION TEMPERATURE, PRODUCED BY THE GRAFTING THROUGH METHOD | Covestro Deutschland AG (DE) | 2020-09-30 | — | — | EP | claimed |
| CN-111386297-A | High molecular weight polyoxyalkylenes with low glass transition temperatures produced by macromer process | 科思创德国股份有限公司 | 2020-07-07 | — | — | CN | claimed |
| WO-2019101702-A1 | HIGH MOLECULAR WEIGHT POLYOXYALKYLENE WITH LOW GLASS TRANSITION TEMPERATURE, PRODUCED BY THE GRAFTING THROUGH METHOD | COVESTRO DEUTSCHLAND AG (DE) | 2019-05-31 | — | — | WO | claimed |
| EP-3489278-A1 | HIGH MOLECULAR WEIGHT POLYOXYETHYLENE WITH DEEP GLASS TEMPERATURE MADE USING THE GRAFTING THROUGH METHOD | Covestro Deutschland AG (DE) | 2019-05-29 | — | — | EP | claimed |
| WO-2016119848-A1 | METHOD FOR THE PREPARATION OF CYCLOALIPHATIC EPOXY RESINS | HENKEL AG & CO. KGAA (DE) | 2016-08-04 | — | — | WO | claimed |
| JP-61005044-A | — | — | None | — | — | JP | disclosed |
| US-12516139-B2 | Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2026-01-06 | — | — | US | disclosed |
| EP-4321541-B1 | RESIN COMPOSITION, RESIN SHEET, MULTILAYER PRINTED WIRING BOARD AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL CO (JP) | 2025-08-06 | — | — | EP | disclosed |
| CN-119866352-A | Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device | 日本化药株式会社 | 2025-04-22 | — | — | CN | disclosed |
| US-12221523-B2 | Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2025-02-11 | — | — | US | disclosed |
| CN-117529509-B | Resin composition, resin sheet, multilayer printed wiring board, and semiconductor device | 三菱瓦斯化学株式会社 | 2025-01-10 | — | — | CN | disclosed |
| US-20050096454-A1 | Amphiphilic polymer capsules and related methods of interfacial assembly | UNIVERSITY OF MASSACHUSETTS | 2005-05-05 | — | — | US | disclosed |
| WO-2005025736-A1 | AMPHIPHILIC POLYMER CAPSULES AND RELATED METHODS OF INTERFACIAL ASSEMBLY | UNIVERSITY OF MASSACHUSETTS (US) | 2005-03-24 | — | — | WO | disclosed |
| US-5510437-A | Organoplatinum polymer and method for producing the same | DIRECTOR-GENERAL OF AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1996-04-23 | — | — | US | disclosed |
| JP-S615044-A | PRODUCTION OF HEPTANOIC ACID DERIVATIVE | AJINOMOTO CO INC | 1986-01-10 | — | — | JP | disclosed |
| US-4506105-A | REACTING CYCLOOCTADIENE 11,5-1 WITH FORMIC ACID, THEN SAPONIFICATION OR TRANSESTERIFICATION | CHEMISCHE WERKE HULS AG (DE) | 1985-03-19 | — | — | US | disclosed |
| US-4039564-A | Production of carboxylic acids from unsaturated hydrocarbons in the presence of HF and A cuprous compound | UOP INC. (US) | 1977-08-02 | — | — | US | disclosed |