SCHEMBL1628318

SCHEMBL1628318

CCC(C)(C)C(=O)OC1CC2CC1C1CC(C(=O)O)CC21

nearest known ligand 0.32

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
SLCO1B1 Q9Y6L6 1/20 0.31
RGS12 O14924 1/20 0.31
APOBEC3A P31941 1/20 0.31
APOBEC3G Q9HC16 1/20 0.31
NPC1 O15118 1/20 0.30
RAB9A P51151 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13219565 0.86
SCHEMBL13563624 0.86 CYP3A4 (0.34) SLCO1B1
SCHEMBL15113765 0.82 CHRM2 (0.30)
SCHEMBL14802461 0.82 SLCO1B1 (0.31) SLCO1B1
SCHEMBL47558 0.80 MAPT (0.49) SLCO1B1NPC1RAB9ANPSR1L3MBTL1
SCHEMBL14802431 0.80 SLCO1B1 (0.32) SLCO1B1RGS12APOBEC3AAPOBEC3G
SCHEMBL13563614 0.80 CYP3A4 (0.32) SLCO1B1
SCHEMBL25805272 0.80 MAPT (0.49) SLCO1B1NPC1RAB9ANPSR1L3MBTL1
SCHEMBL14008118 0.80 MAPT (0.45) SLCO1B1NPC1RAB9ANPSR1L3MBTL1
SCHEMBL15113766 0.78 SLCO1B1 (0.32) SLCO1B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180181003-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE FUJIFILM CORPORATION (JP) 2018-06-28 US disclosed
US-20180180996-A1 PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND LAMINATE FUJIFILM CORPORATION (JP) 2018-06-28 US disclosed
US-20170176862-A1 PATTERN FORMING METHOD, COMPOSITION FOR FORMING PROTECTIVE FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2017-06-22 US disclosed
US-9458343-B2 Method of forming patterns FUJIFILM CORPORATION (JP) 2016-10-04 US disclosed
US-20160009936-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2016-01-14 US disclosed
US-9176386-B2 Method of forming patterns FUJIFILM CORPORATION (JP) 2015-11-03 US disclosed
US-20150044616-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2015-02-12 US disclosed
US-8895225-B2 Method of forming patterns FUJIFILM CORPORATION (JP) 2014-11-25 US disclosed
US-20140080068-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2014-03-20 US disclosed
US-20120088194-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2012-04-12 US disclosed
US-7998655-B2 Method of forming patterns FUJIFILM CORPORATION (JP) 2011-08-16 US disclosed
US-20100203445-A1 NEGATIVE RESIST COMPOSITION AND RESIST PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2010-08-12 US disclosed
US-20090042147-A1 METHOD OF FORMING PATTERNS FUJIFILM CORPORATION (JP) 2009-02-12 US disclosed