Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 3/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.49 |
| ▸ | CA12 | O43570 | 2/20 | 0.49 |
| ▸ | GMNN | O75496 | 2/20 | 0.49 |
| ▸ | CA1 | P00915 | 2/20 | 0.49 |
| ▸ | CA2 | P00918 | 2/20 | 0.49 |
| ▸ | LMNA | P02545 | 2/20 | 0.49 |
| ▸ | BLM | P54132 | 2/20 | 0.49 |
| ▸ | CA9 | Q16790 | 2/20 | 0.49 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.49 |
| ▸ | SGMS1 | Q86VZ5 | 1/20 | 0.49 |
| ▸ | SGMS2 | Q8NHU3 | 1/20 | 0.49 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.48 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.48 |
| ▸ | TSHR | P16473 | 1/20 | 0.48 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25805272 | 1.00 | MAPT (0.49) | MAPTALDH1A1CA12GMNNCA1 | |
| SCHEMBL14008118 | 0.97 | MAPT (0.45) | MAPTALDH1A1CA12GMNNCA1 | |
| SCHEMBL10282815 | 0.88 | MAPT (0.49) | MAPTALDH1A1CA12GMNNCA1 | |
| SCHEMBL22175239 | 0.86 | MAPT (0.47) | MAPTALDH1A1CA12GMNNCA1 | |
| SCHEMBL133305 | 0.86 | MAPT (0.42) | MAPTALDH1A1CA12GMNNCA1 | |
| SCHEMBL16604224 | 0.86 | MAPT (0.42) | MAPTALDH1A1CA12GMNNCA1 | |
| SCHEMBL24268299 | 0.85 | MAPT (0.46) | MAPTALDH1A1CA12GMNNCA1 | |
| SCHEMBL12628487 | 0.85 | MAPT (0.46) | MAPTALDH1A1CA12GMNNCA1 | |
| SCHEMBL18714097 | 0.84 | MAPT (0.54) | MAPTALDH1A1CA12GMNNCA1 | |
| SCHEMBL11941680 | 0.84 | ALDH1A1 (0.32) | MAPTALDH1A1CA12GMNNCA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 745 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240230952-A1 | LAMINATE AND METHOD FOR MANUFACTURING LAMINATE | FUJIFILM CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-20240230952-A1 | LAMINATE AND METHOD FOR MANUFACTURING LAMINATE | FUJIFILM CORPORATION (JP) | 2024-07-11 | — | — | US | disclosed |
| US-12019369-B2 | Coloring composition, color filter, pattern forming method, solid-stage imaging element, and image display device | FUJIFILM CORPORATION (JP) | 2024-06-25 | — | — | US | disclosed |
| US-12019369-B2 | Coloring composition, color filter, pattern forming method, solid-stage imaging element, and image display device | FUJIFILM CORPORATION (JP) | 2024-06-25 | — | — | US | disclosed |
| US-20240027897-A1 | LAMINATE AND MANUFACTURING METHOD OF LAMINATE | FUJIFILM CORPORATION (JP) | 2024-01-25 | — | — | US | disclosed |
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-01-16 | — | — | US | disclosed |
| US-11835857-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-12-05 | — | — | US | disclosed |
| US-11829068-B2 | Resist composition, method of forming resist pattern, compound, and resin | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-28 | — | — | US | disclosed |
| US-11820930-B2 | Polymer compound, liquid crystal composition, phase difference layer, optical film, polarizing plate, and image display device | FUJIFILM CORPORATION (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822240-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-20070141512-A1 | Photosensitive composition, pattern-forming method using the photosensitve composition and compound in the photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-06-21 | — | — | US | disclosed |
| US-20070134588-A1 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070134589-A1 | Positive resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070134590-A1 | Resin showing an increase in solubility in alkali developer by action of an acid, a compound being capable of generating an acid when irradiated with an actinic ray or radiation, an acrylic resin with silicon-containing units and being stable to acids but insoluble in alkali developer, solvent | FUJIFILM CORPORATION. (JP) | 2007-06-14 | — | — | US | disclosed |
| US-20070122741-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-05-31 | — | — | US | disclosed |
| US-7214733-B2 | Positive type resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-20070065752-A1 | Positive resist composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-22 | — | — | US | disclosed |
| US-20070059639-A1 | Positive resist composition and pattern-forming method using the same | FUJI PHOTO FILM CO., LTD. | 2007-03-15 | — | — | US | disclosed |
| US-20070002232-A1 | Optical compensation film, polarizing plate and liquid crystal display device | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |
| US-20070003867-A1 | Resist protective coating material and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11874601-B2 | Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent | MRPS23, MRPS22, SLC11A2 | MAPT 4792/4885ALDH1A1 2173/4885CA12 705/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.