⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14445769 | 0.94 | ACE2 (0.41) | — | |
| SCHEMBL13363992 | 0.94 | ACE2 (0.41) | — | |
| SCHEMBL12188261 | 0.92 | ACE2 (0.50) | — | |
| SCHEMBL18107336 | 0.89 | LMNA (0.43) | — | |
| SCHEMBL13061966 | 0.89 | ACE2 (0.54) | — | |
| SCHEMBL18107306 | 0.89 | ACE2 (0.54) | — | |
| SCHEMBL7209049 | 0.89 | ACE2 (0.54) | — | |
| SCHEMBL7209026 | 0.89 | ACE2 (0.54) | — | |
| SCHEMBL29082283 | 0.89 | ACE2 (0.54) | — | |
| SCHEMBL17411250 | 0.89 | ACE2 (0.54) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4458792-B1 | 1-HALO-2,6,14-TRIMETHYLOCTADECANE COMPOUND AND PROCESS FOR PREPARING 5,13,17-TRIMETHYLALKANE COMPOUND THEREFROM | SHINETSU CHEMICAL CO (JP) | 2026-04-29 | — | — | EP | disclosed |
| US-20240368061-A1 | 1-HALO-2,6,14-TRIMETHYLOCTADECANE COMPOUND AND PROCESS FOR PREPARING 5,13,17-TRIMETHYLALKANE COMPOUND THEREFROM | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-11-07 | — | — | US | disclosed |
| EP-4458792-A1 | 1-HALO-2,6,14-TRIMETHYLOCTADECANE COMPOUND AND PROCESS FOR PREPARING 5,13,17-TRIMETHYLALKANE COMPOUND THEREFROM | Shin-Etsu Chemical Co., Ltd. (JP) | 2024-11-06 | — | — | EP | disclosed |
| CN-118878395-A | 1-Halo-2,6,14-trimethyloctadecane compound and process for preparing 5,13,17-trimethylalkane compound therefrom | 信越化学工业株式会社 | 2024-11-01 | — | — | CN | disclosed |
| CN-109153653-B | Novel compound, photocurable composition, cured product thereof, printing ink, and printed matter using the printing ink | DIC株式会社 | 2022-06-28 | — | — | CN | disclosed |
| US-11079675-B2 | Compound, photocurable composition, cured product of same, printing ink, and printed matter curing the printing ink | DIC CORPORATION (JP) | 2021-08-03 | — | — | US | disclosed |
| CN-111954848-A | Photosensitive resin composition, cured product, insulating material, resin material for solder resist, and resist member | DIC株式会社 | 2020-11-17 | — | — | CN | disclosed |
| WO-2019198490-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, INSULATING MATERIAL, RESIN MATERIAL FOR SOLDER RESISTS AND RESIST MEMBER | DIC株式会社 | 2019-10-17 | — | — | WO | disclosed |
| US-20190137872-A1 | NOVEL COMPOUND, PHOTOCURABLE COMPOSITION, CURED PRODUCT OF SAME, PRINTING INK, AND PRINTED MATTER SURING THE PRINTING INK | DIC CORPORATION (JP) | 2019-05-09 | — | — | US | disclosed |
| CN-109153653-A | New compound, Photocurable composition, its solidfied material, printing ink and the printed article for having used the printing ink | DIC株式会社 | 2019-01-04 | — | — | CN | disclosed |
| US-9738738-B2 | Polymers functionalized with activated nitrogen heterocycles containing a pendant functional group | BRIDGESTONE CORPORATION (JP) | 2017-08-22 | — | — | US | disclosed |
| EP-3181569-A1 | BENZOBIS(THIADIAZOLE) DERIVATIVE, INK CONTAINING SAME, AND ORGANIC ELECTRONIC DEVICE USING SAME | UBE Industries, Ltd. (JP) | 2017-06-21 | — | — | EP | disclosed |
| US-20160289355-A1 | POLYMERS FUNCTIONALIZED WITH ACTIVATED NITROGEN HETEROCYCLES CONTAINING A PENDANT FUNCTIONAL GROUP | BRIDGESTONE CORPORATION (JP) | 2016-10-06 | — | — | US | disclosed |
| CN-104530048-B | Adenine derivatives | 葛兰素史密丝克莱恩有限责任公司 | 2016-09-14 | — | — | CN | disclosed |
| US-20140364398-A1 | C-Linked Hydroxamic Acid Derivatives Useful As Antibacterial Agents | PFIZER INC. (US) | 2014-12-11 | — | — | US | disclosed |