SCHEMBL16300503

SCHEMBL16300503

CC(C)(C)C(=O)n1c2ccccc2c2ccccc21

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.61
LMNA P02545 4/20 0.50
MAPT P10636 2/20 0.50
HTT P42858 2/20 0.50
ALDH1A1 P00352 3/20 0.49
HPGD P15428 2/20 0.49
KDM4E B2RXH2 2/20 0.49
GLA P06280 1/20 0.49
GAA P10253 1/20 0.49
HSD17B10 Q99714 1/20 0.49
ELANE P08246 1/20 0.46
MEN1 O00255 1/20 0.46
KMT2A Q03164 1/20 0.46
SMN1; SMN2 Q16637 1/20 0.46
NPSR1 Q6W5P4 1/20 0.46
P2RX4 Q99571 2/20 0.43
GPR3 P46089 1/20 0.43
CHRM2 P08172 1/20 0.42
CHRM4 P08173 1/20 0.42
CHRM1 P11229 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6721051 0.84 POLB (0.57) POLBLMNAMAPTHTTALDH1A1
SCHEMBL13814102 0.83 MAPT (0.48) POLBLMNAMAPTHTTALDH1A1
SCHEMBL6720986 0.82 POLB (0.55) POLBLMNAMAPTHTTALDH1A1
SCHEMBL15562135 0.81 POLB (0.41) POLBLMNAMAPTHTTALDH1A1
SCHEMBL4773761 0.79 POLB (0.55) POLBLMNAMAPTHTTALDH1A1
SCHEMBL13802417 0.77 ABCB1 (0.62) LMNAMAPTALDH1A1KDM4EGAA
SCHEMBL29771433 0.76 POLB (1.00) POLBLMNAMAPTHTTALDH1A1
SCHEMBL29787117 0.76 POLB (1.00) POLBLMNAMAPTHTTALDH1A1
SCHEMBL153365 0.76 POLB (1.00) POLBLMNAMAPTHTTALDH1A1
SCHEMBL13696680 0.75 CHRM2 (0.59) POLBLMNAMAPTHTTCHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113831360-A Method for synthesizing 1-carbazole-boronic acid pinacol ester through amide ortho-oriented boronation 中钢集团南京新材料研究院有限公司 2021-12-24 CN disclosed
US-8182975-B2 Positive resist composition and pattern forming method using the same FUJIFILM CORPORATION (JP) 2012-05-22 US disclosed
US-20080248419-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-09 US disclosed