SCHEMBL1630463

SCHEMBL1630463

CCC(Cc1ccc(OCCO)cc1)(C(=O)c1ccc(N2CCOCC2)cc1)N(C)C

nearest known ligand 0.46

Predicted protein targets (top 16)

geneUniProtsupporting neighboursconfidence
MAPT P10636 4/20 0.46
L3MBTL1 Q9Y468 2/20 0.46
HRH3 Q9Y5N1 2/20 0.43
HPGD P15428 3/20 0.42
ALDH1A1 P00352 2/20 0.42
LMNA P02545 1/20 0.42
SMN1; SMN2 Q16637 4/20 0.41
GAA P10253 1/20 0.41
MRGPRX4 Q96LA9 1/20 0.41
MAPK1 P28482 1/20 0.41
POLB P06746 1/20 0.41
BCHE P06276 1/20 0.41
ACHE P22303 1/20 0.41
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
FKBP1A P62942 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8897694 0.93 MAPT (0.49) MAPTL3MBTL1HRH3HPGDALDH1A1
SCHEMBL27814785 0.92 BCHE (0.43) MAPTL3MBTL1HRH3HPGDALDH1A1
SCHEMBL1630030 0.91 MAPT (0.46) MAPTL3MBTL1HRH3HPGDALDH1A1
SCHEMBL1630543 0.91 MAPT (0.52) MAPTL3MBTL1HPGDALDH1A1LMNA
SCHEMBL8898741 0.89 MAPT (0.44) MAPTL3MBTL1HRH3HPGDALDH1A1
SCHEMBL8898680 0.89 MAPT (0.47) MAPTL3MBTL1HPGDALDH1A1LMNA
SCHEMBL1630482 0.88 MAPT (0.49) MAPTHPGDALDH1A1LMNASMN1; SMN2
SCHEMBL1631619 0.87 MAPT (0.44) MAPTL3MBTL1HPGDALDH1A1LMNA
SCHEMBL16561590 0.87 MAPT (0.41) MAPTL3MBTL1HPGDALDH1A1LMNA
SCHEMBL1629303 0.86 MAPT (0.53) MAPTL3MBTL1ALDH1A1LMNASMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US claimed
CN-117471850-A Photosensitive composition, method for producing patterned cured product, and black matrix 东京应化工业株式会社 2024-01-30 CN disclosed
CN-115933312-A Colored photosensitive composition, cured product, and image display device 日本化药株式会社 2023-04-07 CN disclosed
CN-112650027-A Method for producing substrate for organic EL panel, and negative photosensitive resin composition 东京应化工业株式会社 2021-04-13 CN disclosed
CN-112147841-A Photosensitive composition, cured product, black matrix, black bank, color filter, image display device, and method for producing patterned cured film 东京应化工业株式会社 2020-12-29 CN disclosed
CN-105467755-B Photosensitive resin composition 东京应化工业株式会社 2020-11-13 CN disclosed
EP-2017311-B1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR CORP (JP) 2012-11-21 EP disclosed
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US disclosed
US-20090118388-A1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR CORPORATION (JP) 2009-05-07 US disclosed
EP-2017311-A1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR Corporation (JP) 2009-01-21 EP disclosed
US-5629356-A PHOTOCURABLE COMPOSITION CONTAINING ETHYLENICALLY UNSATURATED PHOTOPOLYMERIZABLE COMPOUND AND THE AMINOACETOPHENONE CIBA GEIGY CORPORATION (US) 1997-05-13 US disclosed
US-5554663-A α-aminoacetophenones as photoinitiators CIBA-GEIGY CORPORATION (US) 1996-09-10 US disclosed
US-5534629-A PHOTOPOLYMERIZATION OF PIGMENTED SYSTEMS, INKS CIBA-GEIGY CORPORATION (US) 1996-07-09 US disclosed
EP-0284561-B1 ALPHA-AMINOACETOPHENONES AS PHOTO INITIATORS CIBA-GEIGY AG (CH) 1993-05-12 EP disclosed
US-5077402-A For photocuring pigmented systems; printing inks, lacquers CIBA-GEIGY CORPORATION (US) 1991-12-31 US disclosed
EP-0284561-A2 Alpha-aminoacetophenones as photo initiators CIBA-GEIGY AG (CH) 1988-09-28 EP disclosed