Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 7/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 1/20 | 0.47 |
| ▸ | RAB9A | P51151 | 2/20 | 0.47 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.47 |
| ▸ | HTT | P42858 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.47 |
| ▸ | LMNA | P02545 | 2/20 | 0.45 |
| ▸ | FKBP1A | P62942 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | EPAS1 | Q99814 | 1/20 | 0.43 |
| ▸ | NPC1 | O15118 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8898680 | 0.92 | MAPT (0.47) | MAPTSMN1; SMN2HPGDRAB9AALDH1A1 | |
| SCHEMBL1630543 | 0.91 | MAPT (0.52) | MAPTSMN1; SMN2HPGDRAB9AALDH1A1 | |
| SCHEMBL18910301 | 0.90 | MRGPRX4 (0.46) | MAPTSMN1; SMN2HPGDRAB9AALDH1A1 | |
| SCHEMBL1630030 | 0.89 | MAPT (0.46) | MAPTSMN1; SMN2HPGDALDH1A1LMNA | |
| SCHEMBL1629303 | 0.89 | MAPT (0.53) | MAPTSMN1; SMN2RAB9AALDH1A1HTT | |
| SCHEMBL8897694 | 0.89 | MAPT (0.49) | MAPTSMN1; SMN2HPGDRAB9AALDH1A1 | |
| SCHEMBL18910290 | 0.89 | MAPT (0.41) | MAPTSMN1; SMN2ALDH1A1HTTKDM4E | |
| SCHEMBL20097748 | 0.88 | MAPT (0.48) | MAPTSMN1; SMN2HPGDRAB9AALDH1A1 | |
| SCHEMBL58161 | 0.88 | NPC1 (0.48) | MAPTSMN1; SMN2RAB9AAKR1C3ALDH1A1 | |
| SCHEMBL17269413 | 0.88 | MAPT (0.44) | MAPTSMN1; SMN2RAB9AALDH1A1KDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7932300-B2 | Energy beam curable type ink jet printing ink | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | claimed |
| CN-117471850-A | Photosensitive composition, method for producing patterned cured product, and black matrix | 东京应化工业株式会社 | 2024-01-30 | — | — | CN | disclosed |
| CN-115933312-A | Colored photosensitive composition, cured product, and image display device | 日本化药株式会社 | 2023-04-07 | — | — | CN | disclosed |
| CN-114341733-A | Transfer film, method for producing laminate, touch panel sensor, and touch panel | 富士胶片株式会社 | 2022-04-12 | — | — | CN | disclosed |
| CN-112650027-A | Method for producing substrate for organic EL panel, and negative photosensitive resin composition | 东京应化工业株式会社 | 2021-04-13 | — | — | CN | disclosed |
| WO-2021065331-A1 | TRANSFER FILM, LAMINATE PRODUCTION METHOD, LAMINATE, TOUCH PANEL SENSOR, AND TOUCH PANEL | 富士フイルム株式会社 | 2021-04-08 | — | — | WO | disclosed |
| CN-112147841-A | Photosensitive composition, cured product, black matrix, black bank, color filter, image display device, and method for producing patterned cured film | 东京应化工业株式会社 | 2020-12-29 | — | — | CN | disclosed |
| CN-105467755-B | Photosensitive resin composition | 东京应化工业株式会社 | 2020-11-13 | — | — | CN | disclosed |
| US-9023432-B2 | Resist material for imprinting, pattern formation method, and imprinting apparatus | KABUSHIKI KAISHA TOSHIBA (JP) | 2015-05-05 | — | — | US | disclosed |
| US-20130059090-A1 | RESIST MATERIAL FOR IMPRINTING, PATTERN FORMATION METHOD, AND IMPRINTING APPARATUS | KABUSHIKI KAISHA TOSHIBA (JP) | 2013-03-07 | — | — | US | disclosed |
| EP-2017311-B1 | ENERGY RAY-CURABLE INKJET PRINTING INK | JSR CORP (JP) | 2012-11-21 | — | — | EP | disclosed |
| US-7932300-B2 | Energy beam curable type ink jet printing ink | JSR CORPORATION (JP) | 2011-04-26 | — | — | US | disclosed |
| US-20090118388-A1 | ENERGY RAY-CURABLE INKJET PRINTING INK | JSR CORPORATION (JP) | 2009-05-07 | — | — | US | disclosed |
| EP-2017311-A1 | ENERGY RAY-CURABLE INKJET PRINTING INK | JSR Corporation (JP) | 2009-01-21 | — | — | EP | disclosed |
| US-5629356-A | PHOTOCURABLE COMPOSITION CONTAINING ETHYLENICALLY UNSATURATED PHOTOPOLYMERIZABLE COMPOUND AND THE AMINOACETOPHENONE | CIBA GEIGY CORPORATION (US) | 1997-05-13 | — | — | US | disclosed |
| US-5554663-A | α-aminoacetophenones as photoinitiators | CIBA-GEIGY CORPORATION (US) | 1996-09-10 | — | — | US | disclosed |
| US-5534629-A | PHOTOPOLYMERIZATION OF PIGMENTED SYSTEMS, INKS | CIBA-GEIGY CORPORATION (US) | 1996-07-09 | — | — | US | disclosed |
| EP-0284561-B1 | ALPHA-AMINOACETOPHENONES AS PHOTO INITIATORS | CIBA-GEIGY AG (CH) | 1993-05-12 | — | — | EP | disclosed |
| US-5077402-A | For photocuring pigmented systems; printing inks, lacquers | CIBA-GEIGY CORPORATION (US) | 1991-12-31 | — | — | US | disclosed |
| EP-0284561-A2 | Alpha-aminoacetophenones as photo initiators | CIBA-GEIGY AG (CH) | 1988-09-28 | — | — | EP | disclosed |