Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPC1 | O15118 | 2/20 | 0.48 |
| ▸ | RAB9A | P51151 | 2/20 | 0.48 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.48 |
| ▸ | TP53 | P04637 | 1/20 | 0.48 |
| ▸ | PKM | P14618 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.44 |
| ▸ | GAA | P10253 | 2/20 | 0.44 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 8/20 | 0.44 |
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | GSK3B | P49841 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formaldehyde SCHEMBL28912627 | 0.98 | NPC1 (0.46) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL28425131 | 0.97 | NPC1 (0.46) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL27800127 | 0.96 | NPC1 (0.45) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL8898680 | 0.95 | MAPT (0.47) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL28161671 | 0.93 | NPC1 (0.43) | NPC1RAB9AMAPK1TP53PKM | |
| Acetophenone SCHEMBL28437387 | 0.92 | ALDH1A1 (0.43) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL1629303 | 0.92 | MAPT (0.53) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL21300603 | 0.91 | NPC1 (0.41) | NPC1RAB9AMAPK1TP53PKM | |
| SCHEMBL20097748 | 0.91 | MAPT (0.48) | NPC1RAB9AMAPK1L3MBTL1MAPT | |
| SCHEMBL17269413 | 0.91 | MAPT (0.44) | NPC1RAB9AMAPK1TP53PKM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 8347 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-120044753-B | Photosensitive dry film, photosensitive resin composition, cured film and printed circuit board | Hangzhou foster Electronic Materials Co.,Ltd. (CN) | 2026-05-26 | — | — | CN | claimed |
| US-20260078270-A1 | THREE-DIMENSIONAL SURFACE PATTERNING | NAT RES COUNCIL CANADA (CA) | 2026-03-19 | — | — | US | claimed |
| EP-4347263-B1 | PHOTORESIST FORMULATIONS FOR 3D MICROPRINTING TECHNIQUES | FONDAZIONE ST ITALIANO TECNOLOGIA (IT) | 2026-02-25 | — | — | EP | claimed |
| EP-4484454-B1 | BENZOPHENONE DERIVATIVE, METHOD FOR PREPARING SAME, AND USE THEREOF | IGM ANQING HIGH TECH DEVELOPMENT CO LTD (CN) | 2026-02-11 | — | — | EP | claimed |
| US-20250346741-A1 | ADDITIVE MANUFACTURING AND POST-TREATMENT OF INORGANIC MATERIALS | 3D ARCHITECH INC (US) | 2025-11-13 | — | — | US | claimed |
| EP-3662023-B1 | A PHOTOINITIATING COMPOSITION SUITABLE FOR UV-LED LIGHT IRRADIATION AND AN AQUEOUS COATING COMPOSITION PREPARED THEREFROM | GUANGDONG HUARUN PAINTS CO LTD (CN) | 2025-10-22 | — | — | EP | claimed |
| US-12429766-B2 | Photoresist formulations 3D microprinting techniques | FONDAZIONE ISTITUTO ITALIANO DI TECNOLOGIA (IT) | 2025-09-30 | — | — | US | claimed |
| EP-4423203-B1 | SUSTAINABLE RADIATION-CURABLE HYBRID OFFSET INKS | SUN CHEMICAL BV (NL) | 2025-08-20 | — | — | EP | claimed |
| EP-4592338-A1 | POROUS POLYMER STRUCTURE THROUGH ULTRASONIC SPRAYING AND MANUFACTURING METHOD THEREFOR | Agency For Defense Development (KR) | 2025-07-30 | — | — | EP | claimed |
| EP-4590490-A1 | THREE-DIMENSIONAL SURFACE PATTERNING | National Research Council of Canada (CA) | 2025-07-30 | — | — | EP | claimed |
| CN-101022894-A | Polymerization techniques for reducing oxygen inhibition of liquid solidification and compositions therefor | MOLECULAR IMPRINTS INC (US) | 2007-08-22 | — | — | CN | claimed |
| US-7247659-B2 | Photosensitive resin composition | CIBA SPECIALTY CHEMICALS CORPORATION (US) | 2007-07-24 | — | — | US | claimed |
| EP-1796851-A2 | POLYMERIZATION TECHNIQUE TO ATTENUATE OXYGEN INHIBITION OF SOLIDIFICATION OF LIQUIDS AND COMPOSITION THEREFOR | MOLECULAR IMPRINTS, INC. (US) | 2007-06-20 | — | — | EP | claimed |
| US-20060217457-A1 | Curable thermally ejectable printing fluid | IMTECH, INC. | 2006-09-28 | — | — | US | claimed |
| WO-2006102524-A2 | CURABLE THERMALLY EJECTABLE PRINTING FLUID | IMTECH, INC. (US) | 2006-09-28 | — | — | WO | claimed |
| WO-2006036562-A2 | POLYMERIZATION TECHNIQUE TO ATTENUATE OXYGEN INHIBITION OF SOLIDIFICATION OF LIQUIDS AND COMPOSITION THEREFOR | MOLECULAR IMPRINTS, INC. (US) | 2006-04-06 | — | — | WO | claimed |
| US-20060062922-A1 | initiator that consumes oxygen that inhibits polymerization and that generates additional free radicals; oxygen scavenger is 2-methyl-1[4-(methylthio)phenyl]-2-morpholinopropan-1-one; imprint microlithography mold assembly; fluid layer on a substrate while minimizing the trapping of gases therein | MOLECULAR IMPRINTS, INC. (US) | 2006-03-23 | — | — | US | claimed |
| US-20040192804-A1 | Photosensitive resin composition | IGM GROUP B.V. (NL) | 2004-09-30 | — | — | US | claimed |
| EP-1410109-A1 | PHOTOSENSITIVE RESIN COMPOSITION | Ciba SC Holding AG (CH) | 2004-04-21 | — | — | EP | claimed |
| WO-2003010602-A1 | PHOTOSENSITIVE RESIN COMPOSITION | CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) | 2003-02-06 | — | — | WO | claimed |