SCHEMBL1630624

SCHEMBL1630624

CCCC(Cc1ccc(C(C)C)cc1)(C(=O)c1ccc(N2CCOCC2)cc1)N(C)C

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.49
LMNA P02545 3/20 0.49
MAPT P10636 6/20 0.46
L3MBTL1 Q9Y468 4/20 0.46
MAPK1 P28482 4/20 0.46
SMN1; SMN2 Q16637 3/20 0.46
TDP1 Q9NUW8 3/20 0.46
GAA P10253 3/20 0.46
KDM4E B2RXH2 2/20 0.46
ALOX15 P16050 2/20 0.46
ALOX12 P18054 2/20 0.46
KMT2A Q03164 1/20 0.44
FKBP1A P62942 2/20 0.42
HIF1A Q16665 1/20 0.39
LRRK2 Q5S007 1/20 0.39
GSK3B P49841 1/20 0.39
TSHR P16473 1/20 0.38
HTT P42858 1/20 0.38
SLC13A5 Q86YT5 1/20 0.38
ACACB O00763 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1630676 0.92 ALDH1A1 (0.51) ALDH1A1LMNAMAPTL3MBTL1MAPK1
SCHEMBL1629276 0.89 MAPT (0.45) ALDH1A1LMNAMAPTL3MBTL1MAPK1
SCHEMBL8900259 0.88 SMN1; SMN2 (0.46) ALDH1A1LMNAMAPTL3MBTL1SMN1; SMN2
SCHEMBL27634291 0.85 GSK3B (0.49) ALDH1A1LMNAMAPTL3MBTL1MAPK1
SCHEMBL1631744 0.85 ALDH1A1 (0.46) ALDH1A1LMNAMAPTL3MBTL1MAPK1
SCHEMBL8898680 0.84 MAPT (0.47) ALDH1A1LMNAMAPTL3MBTL1MAPK1
SCHEMBL28501827 0.83 POLB (0.40) ALDH1A1LMNAMAPTL3MBTL1MAPK1
SCHEMBL18889520 0.83 ALDH1A1 (0.41) ALDH1A1LMNAMAPTL3MBTL1MAPK1
SCHEMBL7532538 0.83 ALDH1A1 (0.45) ALDH1A1LMNAMAPTL3MBTL1MAPK1
SCHEMBL8900139 0.82 ALDH1A1 (0.39) ALDH1A1LMNAMAPTL3MBTL1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117471850-A Photosensitive composition, method for producing patterned cured product, and black matrix 东京应化工业株式会社 2024-01-30 CN disclosed
CN-115933312-A Colored photosensitive composition, cured product, and image display device 日本化药株式会社 2023-04-07 CN disclosed
CN-112650027-A Method for producing substrate for organic EL panel, and negative photosensitive resin composition 东京应化工业株式会社 2021-04-13 CN disclosed
CN-112147841-A Photosensitive composition, cured product, black matrix, black bank, color filter, image display device, and method for producing patterned cured film 东京应化工业株式会社 2020-12-29 CN disclosed
CN-105467755-B Photosensitive resin composition 东京应化工业株式会社 2020-11-13 CN disclosed
EP-2017311-B1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR CORP (JP) 2012-11-21 EP disclosed
US-7932300-B2 Energy beam curable type ink jet printing ink JSR CORPORATION (JP) 2011-04-26 US disclosed
US-20090118388-A1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR CORPORATION (JP) 2009-05-07 US disclosed
EP-2017311-A1 ENERGY RAY-CURABLE INKJET PRINTING INK JSR Corporation (JP) 2009-01-21 EP disclosed