⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5664436 | 0.78 | — | — | |
| SCHEMBL339221 | 0.78 | — | — | |
| SCHEMBL623568 | 0.76 | — | — | |
| SCHEMBL23094 | 0.74 | — | — | |
| SCHEMBL93904 | 0.74 | — | — | |
| SCHEMBL16197776 | 0.74 | — | — | |
| SCHEMBL7477606 | 0.74 | — | — | |
| SCHEMBL8063620 | 0.74 | — | — | |
| SCHEMBL1278765 | 0.74 | — | — | |
| SCHEMBL190815 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9046775-B2 | Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound | JSR CORPORATION (JP) | 2015-06-02 | — | — | US | disclosed |
| US-20140377707-A9 | COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2014-12-25 | — | — | US | disclosed |