SCHEMBL16320657

SCHEMBL16320657

O=COC1CCC(CO)CC1

nearest known ligand 0.35

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
HPGD P15428 1/20 0.35
ESR1 P03372 1/20 0.31
CYP3A4 P08684 1/20 0.31
CYP2C9 P11712 1/20 0.31
ESR2 Q92731 1/20 0.31
APLNR P35414 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL899641 0.80 HPGD (0.33) HPGD
SCHEMBL23081736 0.80 HPGD (0.33) HPGD
SCHEMBL98197 0.80
SCHEMBL28312954 0.77 HPGD (0.35) HPGD
SCHEMBL186035 0.77 PLG (0.40) HPGD
SCHEMBL5474853 0.77 ESR1 (0.31) ESR1CYP3A4CYP2C9ESR2APLNR
SCHEMBL6689939 0.77 CYP19A1 (0.36) HPGD
SCHEMBL10709604 0.77
SCHEMBL27867937 0.77
Ethoxycarbonyl Group SCHEMBL28322504 0.76 ESR1 (0.31) ESR1CYP3A4CYP2C9ESR2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9046775-B2 Composition for forming liquid immersion upper layer film, resist pattern-forming method, polymer, and compound JSR CORPORATION (JP) 2015-06-02 US disclosed
US-20140377707-A9 COMPOSITION FOR FORMING LIQUID IMMERSION UPPER LAYER FILM, RESIST PATTERN-FORMING METHOD, POLYMER, AND COMPOUND JSR CORPORATION (JP) 2014-12-25 US disclosed