SCHEMBL1633899

SCHEMBL1633899

C=C(C)C(=O)OCCCCCCCCOC(=O)C(F)(F)S(=O)(=O)[O-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 2/20 0.44
HTT P42858 2/20 0.44
POLB P06746 1/20 0.44
APEX1 P27695 1/20 0.44
TSHR P16473 4/20 0.41
KMT2A Q03164 3/20 0.32
MEN1 O00255 2/20 0.32
HDAC1 Q13547 1/20 0.32
HDAC2 Q92769 1/20 0.32
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
THRB P10828 1/20 0.31
CA1 P00915 3/20 0.30
CA2 P00918 3/20 0.30
GAA P10253 1/20 0.30
NPSR1 Q6W5P4 1/20 0.30
CA12 O43570 2/20 0.30
CA9 Q16790 2/20 0.30
CHRM2 P08172 1/20 0.30
CHRM4 P08173 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1634141 0.94 HTT (0.36) TDP1HTTPOLBAPEX1TSHR
SCHEMBL547269 0.86 TDP1 (0.37) TDP1HTTTSHRKMT2AMEN1
SCHEMBL1634200 0.86 TDP1 (0.37) TDP1HTTTSHRKMT2AMEN1
SCHEMBL546823 0.85 TDP1 (0.35) TDP1HTTTSHRKMT2AMEN1
SCHEMBL546301 0.85 TDP1 (0.39) TDP1HTTTSHRKMT2AMEN1
SCHEMBL546870 0.85 TDP1 (0.39) TDP1HTTTSHRKMT2AMEN1
SCHEMBL547443 0.85 TDP1 (0.39) TDP1HTTTSHRKMT2AMEN1
SCHEMBL547113 0.85 TDP1 (0.36) TDP1HTTTSHRKMT2AMEN1
SCHEMBL546826 0.85 TDP1 (0.39) TDP1HTTTSHRKMT2AMEN1
SCHEMBL2183095 0.85 TDP1 (0.39) TDP1HTTTSHRKMT2AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20110165519-A1 RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION CONTAINING THE SAME ANDO NOBUO 2011-07-07 US disclosed
US-7932334-B2 Resin suitable for an acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-04-26 US disclosed