⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3237495 | 1.00 | — | — | |
| SCHEMBL21816919 | 0.89 | — | — | |
| SCHEMBL27822080 | 0.88 | LMNA (0.41) | — | |
| SCHEMBL17615179 | 0.81 | LMNA (0.40) | — | |
| SCHEMBL2445750 | 0.79 | — | — | |
| SCHEMBL6446660 | 0.79 | — | — | |
| SCHEMBL14877214 | 0.79 | — | — | |
| SCHEMBL247202 | 0.79 | — | — | |
| SCHEMBL9537799 | 0.79 | — | — | |
| SCHEMBL17616753 | 0.79 | LMNA (0.41) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1892 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110515270-B | Photosensitive resin composition, pattern forming method, and method for manufacturing optical semiconductor device | 信越化学工业株式会社 | 2024-07-12 | — | — | CN | claimed |
| CN-113563549-B | Asymmetric branched polystyrene-b-polyethylene-butene-propylene-isopropenyl multi-micro block copolymer and preparation method thereof | 中国石油化工股份有限公司 | 2024-05-03 | — | — | CN | claimed |
| US-11693317-B2 | Photosensitive resin composition, pattern forming process, and fabrication of opto-semiconductor device | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-07-04 | — | — | US | claimed |
| CN-113563549-A | Asymmetric branched polystyrene-b-polyethylene-butylene-propylene-isopropylene multi-micro block copolymer and preparation method thereof | 中国石油化工股份有限公司 | 2021-10-29 | — | — | CN | claimed |
| CN-101809502-B | Thick film resists | AZ ELECTRONIC MATERIALS USA | 2014-01-08 | — | — | CN | claimed |
| CN-101082772-B | Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device | JSR CORP | 2013-03-06 | — | — | CN | claimed |
| CN-1295258-C | Tetrafluoroethylene copolymer | ASAHI GLASS CO LTD (JP) | 2007-01-17 | — | — | CN | claimed |
| US-7105270-B2 | Fluoroaliphatic group-containing copolymer | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-12 | — | — | US | claimed |
| CN-1694909-A | Tetrafluoroethylene copolymer | ASAHI GLASS CO LTD (JP) | 2005-11-09 | — | — | CN | claimed |
| US-4087574-A | PHOTOGRAPHY, VINYL OR VINYLIDENE CHLORIDE POLYMERS | FUJI PHOTO FILM CO., LTD. (JA) | 1978-05-02 | — | — | US | claimed |
| EP-4744901-A1 | ON-PRESS DEVELOPMENT TYPE PLANOGRAPHIC PRINTING PLATE ORIGINAL PLATE, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, PLANOGRAPHIC PRINTING METHOD, AND COMPOUND | FUJIFILM Corporation (JP) | 2026-05-20 | — | — | EP | disclosed |
| EP-4744902-A1 | ON-PRESS DEVELOPMENT-TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR, PLANOGRAPHIC PRINTING PLATE PRODUCTION METHOD, AND PLANOGRAPHIC PRINTING METHO | FUJIFILM Corporation (JP) | 2026-05-20 | — | — | EP | disclosed |
| EP-4743828-A1 | PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING | BASF SE (DE) | 2026-05-20 | — | — | EP | disclosed |
| US-20260131567-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, LITHOGRAPHIC PRINTING METHOD, AND COMPOUND | FUJIFILM CORPORATION (JP) | 2026-05-14 | — | — | US | disclosed |
| US-20260131566-A1 | ON-PRESS DEVELOPMENT TYPE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PREPARING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION (JP) | 2026-05-14 | — | — | US | disclosed |
| US-4050936-A | Image forming process with photopolymer layers between a support and a substrate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |
| US-4041017-A | Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams | FUJI PHOTO FILM CO., LTD. (JA) | 1977-08-09 | — | — | US | disclosed |
| US-3963495-A | Image-receiving element for silver salt diffusion transfer with layer of monoacrylates or monomethacrylates of polyhydric alcohols | FUJI PHOTO FILM CO., LTD. (JA) | 1976-06-15 | — | — | US | disclosed |
| US-3936429-A | Reactive polymer | FUJI PHOTO FILM CO., LTD. (JA) | 1976-02-03 | — | — | US | disclosed |
| US-3931248-A | Reactive high polymer compound | FUJI PHOTO FILM CO., LTD. (JA) | 1976-01-06 | — | — | US | disclosed |