⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27485262 | 1.00 | — | — | |
| SCHEMBL27717542 | 0.89 | — | — | |
| SCHEMBL1562371 | 0.89 | — | — | |
| SCHEMBL9334081 | 0.88 | SMYD3 (0.30) | — | |
| SCHEMBL319607 | 0.87 | SHBG (0.32) | — | |
| SCHEMBL1315982 | 0.87 | SHBG (0.32) | — | |
| SCHEMBL2861326 | 0.82 | — | — | |
| SCHEMBL3742136 | 0.76 | PPM1B (0.32) | — | |
| SCHEMBL19927410 | 0.76 | — | — | |
| SCHEMBL27522928 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7098149-B2 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2006-08-29 | — | — | US | claimed |
| EP-3231892-B1 | MECHANICAL ENHANCEMENT OF DENSE AND POROUS ORGANOSILICATE MATERIALS BY UV EXPOSURE | VERSUM MAT US LLC (US) | 2020-08-05 | — | — | EP | disclosed |
| EP-3231892-A1 | MECHANICAL ENHANCEMENT OF DENSE AND POROUS ORGANOSILICATE MATERIALS BY UV EXPOSURE | Versum Materials US, LLC (US) | 2017-10-18 | — | — | EP | disclosed |
| EP-1457583-B1 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | AIR PROD & CHEM (US) | 2017-05-31 | — | — | EP | disclosed |
| US-20130260575-A1 | SILICON PRECURSORS AND COMPOSITIONS COMPRISING SAME FOR DEPOSITING LOW DIELECTRIC CONSTANT FILMS | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-10-03 | — | — | US | disclosed |
| US-8293001-B2 | Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2012-10-23 | — | — | US | disclosed |
| US-20110143032-A1 | Porogens, Porogenated Precursors and Methods for Using the Same to Provide Porous Organosilica Glass Films With Low Dielectric Constants | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-06-16 | — | — | US | disclosed |
| US-7932188-B2 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-04-26 | — | — | US | disclosed |
| US-20090054674-A1 | Mechanical Enhancement of Dense and Porous Organosilicate Materials by UV Exposure | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2009-02-26 | — | — | US | disclosed |
| US-7468290-B2 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2008-12-23 | — | — | US | disclosed |
| EP-1873818-A2 | Process for curing dielectric films | Air Products and Chemicals, Inc. (US) | 2008-01-02 | — | — | EP | disclosed |
| EP-1561841-A2 | Cleaning CVD Chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2005-08-10 | — | — | EP | disclosed |
| US-20050161060-A1 | Cleaning CVD chambers following deposition of porogen-containing materials | AIR PRODUCTS AND CHEMICALS, INC. | 2005-07-28 | — | — | US | disclosed |
| EP-1457583-A2 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2004-09-15 | — | — | EP | disclosed |
| US-20040175501-A1 | Mechanical enhancement of dense and porous organosilicate materials by UV exposure | VERSUM MATERIALS US, LLC | 2004-09-09 | — | — | US | disclosed |