SCHEMBL1638902

SCHEMBL1638902

CCO[Si]1(OCC)O[Si](OCC)(OCC)O[Si](OCC)(OCC)O[Si](OCC)(OCC)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3473609 1.00
SCHEMBL10620582 1.00
SCHEMBL3476009 1.00
SCHEMBL7644104 1.00
SCHEMBL10621303 0.88
SCHEMBL8376909 0.86
SCHEMBL456060 0.86
SCHEMBL10625600 0.86
SCHEMBL14431675 0.82
SCHEMBL14431674 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12145937-B2 Process for preparing bicyclic guanidines WACKER CHEMIE AG (DE) 2024-11-19 US disclosed
US-20210214367-A1 PROCESS FOR PREPARING BICYCLIC GUANIDINES WACKER CHEMIE AG (DE) 2021-07-15 US disclosed
CN-112638913-A Process for preparing bicyclic guanidines 瓦克化学股份公司 2021-04-09 CN disclosed
EP-3774807-A1 PROCESS FOR PREPARING BICYCLIC GUANIDINES Wacker Chemie AG (DE) 2021-02-17 EP disclosed
EP-1391476-B1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO LTD (JP) 2015-12-09 EP disclosed
US-8536242-B2 Photocurable composition SEKISUI CHEMICAL CO., LTD. (JP) 2013-09-17 US disclosed
US-8513448-B2 Cyclic siloxane compound, a material for forming Si-containing film, and its use TOSOH CORPORATION (JP) 2013-08-20 US disclosed
US-20110097669-A1 PHOTOCURABLE COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 2011-04-28 US disclosed
EP-2256123-A2 Cyclic siloxane compound, a material for forming Si-containing film, and its use Tosoh Corporation (JP) 2010-12-01 EP disclosed
US-20100052114-A1 CYCLIC SILOXANE COMPOUND, A MATERIAL FOR FORMING SI-CONTAINING FILM, AND ITS USE TOSOH CORPORATION (JP) 2010-03-04 US disclosed
US-7169872-B2 Hybrid silicon-containing coupling agents for filled elastomer compositions GENERAL ELECTRIC CO. (US) 2007-01-30 US disclosed
US-20050186360-A1 Cellulose acylate film FUJI FILM PHOTO CO., LTD. (JP) 2005-08-25 US disclosed
CN-1610687-A Hybrid silicon-containing coupling agents for filled elastomer compositions CROMPTON CORP (US) 2005-04-27 CN disclosed
US-20040202956-A1 a photocurable mixture of a hydrolyzable metal (silyl) compound and a reaction, polymerization or crosslinking promoter; curing; adhesives, seals, semiconductors, dielectrics, microlenses, optical fibers, color filters, gas permeable films SEKISUI CHEMICAL CO., LTD. (JP) 2004-10-14 US disclosed
EP-1391476-A1 PHOTOREACTIVE COMPOSITION SEKISUI CHEMICAL CO., LTD. (JP) 2004-02-25 EP disclosed
EP-1383776-A2 HYBRID SILICON-CONTAINING COUPLING AGENTS FOR FILLED ELASTOMER COMPOSITIONS CROMPTON CORPORATION (US) 2004-01-28 EP disclosed
US-20030055139-A1 Hybrid silicon-containing coupling agents for filled elastomer compositions MOMENTIVE PERFORMANCE MATERIALS INC. 2003-03-20 US disclosed
WO-2002096914-A2 HYBRID SILICON-CONTAINING COUPLING AGENTS FOR FILLED ELASTOMER COMPOSITIONS CROMPTON CORPORATION (US) 2002-12-05 WO disclosed
US-4824985-A Novel route to Ca8 Si4 O12 Cl8, alkoxycyclotetrasiloxanes, aryloxycyclotetrasiloxanes, alkylcyclotetrasiloxanes and arylcyclotetrasiloxanes from wollastonite (Ca SiO3) DOW CORNING CORPORATION (US) 1989-04-25 US disclosed
US-4717773-A Silicate esters and organosilicon compounds CASE WESTERN RESERVE UNIVERSITY, A NON-PROFIT ORGANIZATION 1988-01-05 US disclosed