SCHEMBL3476009

SCHEMBL3476009

CCO[Si]1(OCC)O[Si](OCC)(OCC)O[Si](OCC)(OCC)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3473609 1.00
SCHEMBL10620582 1.00
SCHEMBL1638902 1.00
SCHEMBL7644104 1.00
SCHEMBL10621303 0.88
SCHEMBL8376909 0.86
SCHEMBL456060 0.86
SCHEMBL10625600 0.86
SCHEMBL14431675 0.82
SCHEMBL14431674 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8513448-B2 Cyclic siloxane compound, a material for forming Si-containing film, and its use TOSOH CORPORATION (JP) 2013-08-20 US disclosed
EP-2256123-A2 Cyclic siloxane compound, a material for forming Si-containing film, and its use Tosoh Corporation (JP) 2010-12-01 EP disclosed
US-20100052114-A1 CYCLIC SILOXANE COMPOUND, A MATERIAL FOR FORMING SI-CONTAINING FILM, AND ITS USE TOSOH CORPORATION (JP) 2010-03-04 US disclosed
EP-1845100-A1 CYCLIC SILOXANE COMPOUND, Si-CONTAINING FILM-FORMING MATERIAL, AND USE THEREOF Tosoh Corporation (JP) 2007-10-17 EP disclosed
US-4824985-A Novel route to Ca8 Si4 O12 Cl8, alkoxycyclotetrasiloxanes, aryloxycyclotetrasiloxanes, alkylcyclotetrasiloxanes and arylcyclotetrasiloxanes from wollastonite (Ca SiO3) DOW CORNING CORPORATION (US) 1989-04-25 US disclosed
US-4717773-A Silicate esters and organosilicon compounds CASE WESTERN RESERVE UNIVERSITY, A NON-PROFIT ORGANIZATION 1988-01-05 US disclosed