SCHEMBL163948

SCHEMBL163948

FC#CC(F)(F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1819764 0.84
SCHEMBL1559869 0.79
SCHEMBL1685090 0.79
SCHEMBL1820462 0.76
SCHEMBL1819655 0.76 LMNA (0.32)
SCHEMBL6358198 0.74 LMNA (0.36)
SCHEMBL15352117 0.74 LMNA (0.36)
SCHEMBL18130241 0.74 LMNA (0.36)
SCHEMBL1822812 0.72
SCHEMBL18672442 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 236 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4747220-A1 SYSTEMS AND PROCESSES FOR THE PRODUCTION OF Z-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE The Chemours Company FC, LLC (US) 2026-05-27 EP claimed
WO-2025019751-A1 SYSTEMS AND PROCESSES FOR THE PRODUCTION OF Z-1,1,1,4,4,4-HEXAFLUORO-2-BUTENE THE CHEMOURS COMPANY FC, LLC (US) 2025-01-23 WO claimed
CN-115894164-A Preparation method of hexafluorobutyne 西安近代化学研究所 2023-04-04 CN claimed
CN-115611702-A Preparation method of cis-hexafluoro-2-butene 西安近代化学研究所 2023-01-17 CN claimed
CN-112194561-B Preparation method of cis-hexafluoro-2-butene 西安近代化学研究所 2022-11-11 CN claimed
CN-112194561-A Preparation method of cis-hexafluoro-2-butene 西安近代化学研究所 2021-01-08 CN claimed
US-8728882-B2 Manufacturing method for thin film transistor array panel SAMSUNG DISPLAY CO., LTD. (KR) 2014-05-20 US claimed
US-20130260568-A1 MANUFACTURING METHOD FOR THIN FILM TRANSISTOR ARRAY PANEL SAMSUNG DISPLAY CO., LTD. (KR) 2013-10-03 US claimed
US-8530709-B2 Process for the production of fluorinated alkenes HONEYWELL INTERNATIONAL INC. (US) 2013-09-10 US claimed
EP-2571835-A2 PROCESS FOR THE PRODUCTION OF FLUORINATED ALKENES Honeywell International, Inc. (US) 2013-03-27 EP claimed
US-20110124928-A1 Gas production facility, gas supply container, and gas for manufacture of electronic devices ZEON CORPORATION (JP) 2011-05-26 US claimed
US-20100304276-A1 MASK AND METHOD FOR FABRICATING THE SAME HYNIX SEMICONDUCTOR INC. (KR) 2010-12-02 US claimed
US-20100219564-A1 Resin Molding Apparatus and Resin Molding Process OHMI TADAHIRO 2010-09-02 US claimed
US-20080090422-A1 ETCHING METHOD UNITED MICROELECTRONICS CORP. (TW) 2008-04-17 US claimed
US-20070282142-A1 Gas Production Facility, Gas Supply Container, And Gas For Manufacture Of Electronic Devices ZEON CORPORATION (JP) 2007-12-06 US claimed
EP-1744092-A1 APPARATUS FOR PRODUCING GAS, VESSEL FOR SUPPLYING GAS AND GAS FOR USE IN MANUFACTURING ELECTRONIC DEVICE OHMI, Tadahiro (JP) 2007-01-17 EP claimed
US-20060281313-A1 ETCHING METHOD AND METHOD FOR FORMING CONTACT OPENING UNITED MICROELECTRONICS CORP. (TW) 2006-12-14 US claimed
US-6544429-B1 Using hexafluorobutylene etchant and inert gas diluents APPLIED MATERIALS INC. 2003-04-08 US claimed
EP-1090016-B1 THE PREPARATION OF ARYLPHOSPHINES CHIROTECH TECHNOLOGY LTD (GB) 2002-10-30 EP claimed
WO-2000059021-A1 ENHANCEMENT OF SILICON OXIDE ETCH RATE AND SUBSTRATE SELECTIVITY WITH XENON ADDITION APPLIED MATERIAL, INC. (US) 2000-10-05 WO claimed