SCHEMBL1642968

SCHEMBL1642968

C=C(C)C(=O)OCOC(C)C

nearest known ligand 0.57

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.57
THRB P10828 1/20 0.44
ALDH1A1 P00352 2/20 0.41
POLB P06746 1/20 0.33
APEX1 P27695 1/20 0.33
HTT P42858 1/20 0.33
TDP1 Q9NUW8 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12732378 0.82 TSHR (0.57) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL7628366 0.82 TSHR (0.52) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL7742905 0.82 TSHR (0.52) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL148579 0.81 TSHR (0.58) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL554732 0.81 THRB (0.57) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL16944260 0.80 TSHR (0.55) TSHRTHRBALDH1A1TDP1
SCHEMBL7634480 0.80 TSHR (0.50) TSHRTHRBALDH1A1
Hydrochloric Acid SCHEMBL14976774 0.79 TSHR (0.56) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL19680509 0.78 TSHR (0.57) TSHRTHRBALDH1A1POLBAPEX1
SCHEMBL2608240 0.78 TSHR (0.61) TSHRTHRBALDH1A1POLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8993213-B2 Positive-working lithographic printing plate EASTMAN KODAK COMPANY (US) 2015-03-31 US claimed
US-20150072289-A9 POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE BANK OF AMERICA, N.A., AS AGENT 2015-03-12 US claimed
US-20140162187-A1 POSITIVE-WORKING LITHOGRAPHIC PRINTING PLATE SAVARIAR-HAUCK CELIN (DE) 2014-06-12 US claimed
EP-1776399-B1 MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS UNIV GENT (BE) 2012-11-14 EP claimed
CN-101861245-B Multilayer imageable element with improved properties EASTMAN KODAK CO 2012-08-29 CN claimed
US-7824840-B2 polymeric binder provides the post-development bakeability of imaged elements while increasing imaging sensitivity (speed) and maintaining resistance to press chemicals; solvent resistance; lithographic printing plates EASTMAN KODAK COMPANY (US) 2010-11-02 US claimed
CN-101861245-A Multilayer imageable element with improved properties EASTMAN KODAK CO 2010-10-13 CN claimed
US-20090042135-A1 polymeric binder provides the post-development bakeability of imaged elements while increasing imaging sensitivity (speed) and maintaining resistance to press chemicals; solvent resistance; lithographic printing plates BANK OF AMERICA, N.A., AS AGENT 2009-02-12 US claimed
US-20230161257-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-05-25 US disclosed
US-20230152697-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-05-18 US disclosed
EP-3345055-B1 LITHOGRAPHIC DEVELOPER COMPOSITION AND METHOD OF USE EASTMAN KODAK CO (US) 2019-09-18 EP disclosed
US-20180223133-A1 BIO-ELECTRODE COMPOSITION, BIO-ELECTRODE, METHOD FOR MANUFACTURING THE BIO-ELECTRODE, AND POLYMER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-08-09 US disclosed
EP-3345055-A1 LITHOGRAPHIC DEVELOPER COMPOSITION AND METHOD OF USE Eastman Kodak Company (US) 2018-07-11 EP disclosed
US-20170068164-A1 LITHOGRAPHIC DEVELOPER COMPOSITION AND METHOD OF USE BANK OF AMERICA, N.A., AS AGENT 2017-03-09 US disclosed
US-20080262160-A1 Monodisperse Polymers Containing (Alkyl)Acrylic Acid Moieties, Precursors and Methods for Making them and their Applications UNIVERSITEIT GENT (BE) 2008-10-23 US disclosed
EP-1776399-A1 MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS UNIVERSITEIT GENT (BE) 2007-04-25 EP disclosed
WO-2006002496-A1 MONODISPERSE POLYMERS CONTAINING (ALKYL)ACRYLIC ACID MOIETIES, PRECURSORS AND METHODS FOR MAKING THEM AND THEIR APPLICATIONS UNIVERSITEIT GENT (BE) 2006-01-12 WO disclosed
CN-1207633-C Positive film type light sensitiveness anticorrosion additive compsn. and application thereof MITSUI CHEMICALS INC (JP) 2005-06-22 CN disclosed
CN-1397841-A Positive film type light sensitiveness anticorrosion additive compsn. and application thereof MITSUI CHEMICALS INC (JP) 2003-02-19 CN disclosed
US-5576406-A ACRYLATE POLYMERS FOR PAINTS, ADHESIVES OR SEALS DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-11-19 US disclosed