⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propene SCHEMBL15170679 | 0.78 | — | — | |
| SCHEMBL3784688 | 0.75 | — | — | |
| SCHEMBL3784685 | 0.75 | — | — | |
| SCHEMBL924697 | 0.75 | — | — | |
| SCHEMBL926351 | 0.73 | MEN1 (0.30) | — | |
| SCHEMBL20670 | 0.72 | — | — | |
| Methylamine SCHEMBL2425514 | 0.71 | — | — | |
| SCHEMBL11668132 | 0.69 | — | — | |
| Hydrochloric Acid SCHEMBL310744 | 0.69 | — | — | |
| Ethylene SCHEMBL20544036 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 490 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170002221-A1 | UV CURABLE INK JET RECORDING INK COMPOSITION, INK CONTAINER AND INK JET RECORDING APPARATUS | SEIKO EPSON CORPORATION (JP) | 2017-01-05 | — | — | US | claimed |
| CN-1297577-C | Fluoropolymers having improved compression set | 3M INNOVATIVE PROPERTIES CO (US) | 2007-01-31 | — | — | CN | claimed |
| CN-1668658-A | Fluoropolymers having improved compression set | 3M INNOVATIVE PROPERTIES CO (US) | 2005-09-14 | — | — | CN | claimed |
| US-20240218244-A1 | CURED FILM AND DISPLAY DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| WO-2024135086-A1 | PHOTOCURABLE COMPOSITION, UNDERCOAT LAYER, LAMINATE AND DISPLAY DEVICE | 株式会社ダイセル | 2024-06-27 | — | — | WO | disclosed |
| US-12006440-B2 | Radiation curable inkjet inks for interior decoration | AGFA NV (BE) | 2024-06-11 | — | — | US | disclosed |
| US-20240181794-A1 | Ink Jet Method And Ink Jet Apparatus | SEIKO EPSON CORP (JP) | 2024-06-06 | — | — | US | disclosed |
| WO-2024111420-A1 | ALKALI-SOLUBLE RESIN, LIGHT-SENSITIVE RESIN COMPOSITION, METHODS RESPECTIVELY FOR PRODUCING THOSE, AND USE OF THOSE | 株式会社日本触媒 | 2024-05-30 | — | — | WO | disclosed |
| US-20240166791-A1 | CURED FILM AND DISPLAY DEVICE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-05-23 | — | — | US | disclosed |
| US-11981823-B2 | Radiation-curable ink jet composition and ink jet method | SEIKO EPSON CORPORATION (JP) | 2024-05-14 | — | — | US | disclosed |
| WO-2024095560-A1 | INK COMPOSITION FOR BLOCKING UV RAYS, AND METHOD FOR PRODUCING SUBSTRATE HAVING EMBOSSED SURFACE USING SAME | サカタインクス株式会社 | 2024-05-10 | — | — | WO | disclosed |
| US-6767980-B2 | ACTIVATED ENERGY RAY-CURABLE INK COMPOSITION FOR INK-JET PRINTING; VINYL ETHER GROUP-CONTAINING (METH)ACRYLIC ESTER | NIPPON SHOKUBAI CO., LTD. (JP) | 2004-07-27 | — | — | US | disclosed |
| US-6689844-B2 | ETHYLENICALLY UNSATURATED MONOMERS ARE POLYMERIZED BY INITIATORS WITH A TRANSFERABLE HALOGEN AND TRANSITION METAL CATALYSTS IN THE PRESENCE OF LIGANDS WHICH FORM A COORDINATION COMPOUND, AND REACTING WITH A NITROGEN COMPOUND | ROHMAX ADDITIVES GMBH (DE) | 2004-02-10 | — | — | US | disclosed |
| US-20030199655-A1 | Reactive diluent and curable resin composition | NIPPON SHOKUBAI CO., LTD. | 2003-10-23 | — | — | US | disclosed |
| US-20030134926-A1 | (Meth) acryloyl group-containing compound and method for producing the same | NIPPON SHOKUBAI CO., LTD. | 2003-07-17 | — | — | US | disclosed |
| EP-1308434-A1 | (Meth)acryloyl group-containing compound and method for producing the same | Nippon Shokubai Co., Ltd. (JP) | 2003-05-07 | — | — | EP | disclosed |
| US-20020188081-A1 | Process for synthesis of polymer compositions with reduced halogen content, polymer composition with reduced halogen content as well as use of this composition | ROHMAX ADDITIVES GMBH KIRSCHENALLEE (DE) | 2002-12-12 | — | — | US | disclosed |
| US-20020143120-A1 | Composition of vinyl ether group-containing (meth) acrylic acid ester and production method thereof | NIPPON SHOKUBAI CO., LTD. | 2002-10-03 | — | — | US | disclosed |
| EP-1201641-A2 | Composition of vinyl ether group containing (meth)acrylic acid ester and production method thereof | Nippon Shokubai Co., Ltd. (JP) | 2002-05-02 | — | — | EP | disclosed |
| US-6348554-B1 | TRANSITION METAL COORDINATION CATALYST IS OXIDIZED AFTER ADDITION POLYMERIZATION AND SEPARATED BY FILTRATION; CONTAINS SOLVENT WITH LOW DIELECTRIC CONSTANT; CATALYSIS | ROHMAX ADDITIVES GMBH (DE) | 2002-02-19 | — | — | US | disclosed |