SCHEMBL924697

SCHEMBL924697

C=COCCOC[CH]C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL926351 0.98 MEN1 (0.30)
SCHEMBL501087 0.79
SCHEMBL939722 0.78 MEN1 (0.32)
SCHEMBL7764417 0.78 ALDH1A1 (0.38)
SCHEMBL143831 0.78 ALDH1A1 (0.38)
SCHEMBL37264 0.78 ALDH1A1 (0.38)
SCHEMBL36823 0.78 ALDH1A1 (0.38)
SCHEMBL1538375 0.78 ALDH1A1 (0.38)
SCHEMBL20582128 0.78 ALDH1A1 (0.38)
SCHEMBL17082940 0.77 MEN1 (0.41)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240218244-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-07-04 US disclosed
US-20240166791-A1 CURED FILM AND DISPLAY DEVICE SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-05-23 US disclosed
WO-2024084904-A1 CURABLE COMPOSITION, CURED FILM, AND DISPLAY DEVICE 住友化学株式会社 2024-04-25 WO disclosed
EP-4332122-A1 CURED FILM AND DISPLAY DEVICE Sumitomo Chemical Company, Limited (JP) 2024-03-06 EP disclosed
EP-4332123-A1 CURED FILM AND DISPLAY DEVICE Sumitomo Chemical Company Limited (JP) 2024-03-06 EP disclosed
US-20230340289-A1 PHOTOSENSITIVE COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-26 US disclosed
WO-2023189203-A1 COMPOSITION, FILM, AND DISPLAY DEVICE 住友化学株式会社 2023-10-05 WO disclosed
WO-2023189204-A1 COMPOSITION, FILM, AND DISPLAY DEVICE 住友化学株式会社 2023-10-05 WO disclosed
WO-2023189205-A1 COMPOSITION, FILM, AND DISPLAY DEVICE 住友化学株式会社 2023-10-05 WO disclosed
EP-4227374-A2 PHOTOSENSITIVE COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-16 EP disclosed
US-20230034267-A1 PHOTOSENSITIVE COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-02-02 US disclosed
US-11066563-B2 Radiation curable ink SEIKO EPSON CORPORATION 2021-07-20 US disclosed
US-10953657-B2 Ink jet printing apparatus and printing head SEIKO EPSON CORPORATION 2021-03-23 US disclosed
US-10913862-B2 Antifouling film SHARP KABUSHIKI KAISHA (JP) 2021-02-09 US disclosed
US-20200165475-A1 Radiation-Curable Ink Jet Ink Set And Ink Jet Printing Method SEIKO EPSON CORPORATION (JP) 2020-05-28 US disclosed
US-20200156375-A1 INK JET PRINTING APPARATUS AND PRINTING HEAD SEIKO EPSON CORPORATION (JP) 2020-05-21 US disclosed
US-20200102465-A1 RADIATION CURABLE INK SEIKO EPSON CORPORATION (JP) 2020-04-02 US disclosed
US-20190338149-A1 ANTIFOULING FILM SHARP KABUSHIKI KAISHA (JP) 2019-11-07 US disclosed
US-8399583-B2 Polymer, curable resin composition, cured product, and article NIPPON SHOKUBAI CO., LTD. (JP) 2013-03-19 US disclosed
US-20110009586-A1 POLYMER, CURABLE RESIN COMPOSITION, CURED PRODUCT, AND ARTICLE NIPPON SHOKUBAI CO., LTD. (JP) 2011-01-13 US disclosed