⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4727359 | 0.78 | — | — | |
| SCHEMBL12233189 | 0.78 | — | — | |
| Hydrochloric Acid SCHEMBL1228322 | 0.76 | — | — | |
| SCHEMBL6176566 | 0.75 | — | — | |
| SCHEMBL17417868 | 0.74 | — | — | |
| SCHEMBL7879160 | 0.73 | — | — | |
| SCHEMBL6178556 | 0.73 | — | — | |
| SCHEMBL13236673 | 0.72 | — | — | |
| SCHEMBL16687329 | 0.71 | — | — | |
| SCHEMBL270966 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 887 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-111826022-A | UV (ultraviolet) photocuring high-corrosion-resistance and high-sensitivity liquid photosensitive ink and preparation method thereof | 张家港科思创感光新材料有限公司 | 2020-10-27 | — | — | CN | claimed |
| CN-101809502-B | Thick film resists | AZ ELECTRONIC MATERIALS USA | 2014-01-08 | — | — | CN | claimed |
| US-7504446-B2 | Aqueous inks containing colored polymers | XEROX CORPORATION (US) | 2009-03-17 | — | — | US | claimed |
| US-7105270-B2 | Fluoroaliphatic group-containing copolymer | FUJI PHOTO FILM CO., LTD. (JP) | 2006-09-12 | — | — | US | claimed |
| US-20060074142-A1 | Aqueous inks containing colored polymers | XEROX CORPORATION | 2006-04-06 | — | — | US | claimed |
| US-4087574-A | PHOTOGRAPHY, VINYL OR VINYLIDENE CHLORIDE POLYMERS | FUJI PHOTO FILM CO., LTD. (JA) | 1978-05-02 | — | — | US | claimed |
| WO-2025132182-A2 | POST-EXPOSURE BAKE LESS CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION | MERCK PATENT GMBH (DE) | 2025-06-26 | — | — | WO | disclosed |
| CN-120118458-A | Curable composition, resin, and cured product | 东京应化工业株式会社 | 2025-06-10 | — | — | CN | disclosed |
| CN-120044752-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| CN-120044751-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| US-12312489-B2 | Curable composition, cured product and method for forming insulating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-05-27 | — | — | US | disclosed |
| CN-119937242-A | Photosensitive resin composition | 东京应化工业株式会社 | 2025-05-06 | — | — | CN | disclosed |
| CN-112394438-B | Method for manufacturing color filter, and resin composition | 东京应化工业株式会社 | 2025-01-03 | — | — | CN | disclosed |
| US-4058443-A | PHOTOPOLYMERIZATION, BINDER, CHLORINATED POLYOLEFIN | FUJI PHOTO FILM CO., LTD. (JA) | 1977-11-15 | — | — | US | disclosed |
| US-4054722-A | PHOTOGRAPHY | FUJI PHOTO FILM CO., LTD. (JA) | 1977-10-18 | — | — | US | disclosed |
| US-4050936-A | Image forming process with photopolymer layers between a support and a substrate | FUJI PHOTO FILM CO., LTD. (JA) | 1977-09-27 | — | — | US | disclosed |
| US-4041017-A | Reactive light-sensitive high polymer compound containing furyl pentadienic ester groups and insolubilized by action of heat, light or electron beams | FUJI PHOTO FILM CO., LTD. (JA) | 1977-08-09 | — | — | US | disclosed |
| US-3963495-A | Image-receiving element for silver salt diffusion transfer with layer of monoacrylates or monomethacrylates of polyhydric alcohols | FUJI PHOTO FILM CO., LTD. (JA) | 1976-06-15 | — | — | US | disclosed |
| US-3936429-A | Reactive polymer | FUJI PHOTO FILM CO., LTD. (JA) | 1976-02-03 | — | — | US | disclosed |
| US-3931248-A | Reactive high polymer compound | FUJI PHOTO FILM CO., LTD. (JA) | 1976-01-06 | — | — | US | disclosed |