Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.46 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.46 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.46 |
| ▸ | IDO1 | P14902 | 3/20 | 0.44 |
| ▸ | NOS3 | P29474 | 1/20 | 0.44 |
| ▸ | NOS1 | P29475 | 1/20 | 0.44 |
| ▸ | NOS2 | P35228 | 1/20 | 0.44 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.44 |
| ▸ | MAOB | P27338 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.43 |
| ▸ | EGFR | P00533 | 1/20 | 0.42 |
| ▸ | CTSL | P07711 | 1/20 | 0.41 |
| ▸ | CTSB | P07858 | 1/20 | 0.41 |
| ▸ | CA12 | O43570 | 1/20 | 0.41 |
| ▸ | CA1 | P00915 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Dibenzyl Disulfide SCHEMBL16332737 | 0.91 | HSD17B10 (0.52) | ALDH1A1HSD17B10CYP1A2CYP3A4CYP2D6 | |
| Dibenzyl Disulfide SCHEMBL160895 | 0.91 | HSD17B10 (0.52) | ALDH1A1HSD17B10CYP1A2CYP3A4CYP2D6 | |
| Dibenzyl Disulfide SCHEMBL28328349 | 0.88 | HSD17B10 (0.50) | ALDH1A1HSD17B10CYP1A2CYP3A4CYP2D6 | |
| Dibenzyl Disulfide SCHEMBL5313009 | 0.88 | ALDH1A1 (0.50) | ALDH1A1HSD17B10CYP1A2CYP3A4CYP2D6 | |
| Dibenzyl Disulfide SCHEMBL27269628 | 0.88 | HSD17B10 (0.50) | ALDH1A1HSD17B10CYP1A2CYP3A4CYP2D6 | |
| Dibenzyl Disulfide SCHEMBL28928181 | 0.88 | ALDH1A1 (0.50) | ALDH1A1HSD17B10CYP1A2CYP3A4CYP2D6 | |
| Dibenzyl Disulfide SCHEMBL31120434 | 0.88 | HSD17B10 (0.50) | ALDH1A1HSD17B10CYP1A2CYP3A4CYP2D6 | |
| Dibenzyl Disulfide SCHEMBL32679343 | 0.88 | HSD17B10 (0.50) | ALDH1A1HSD17B10CYP1A2CYP3A4CYP2D6 | |
| Dibenzyl Disulfide SCHEMBL30254005 | 0.88 | HSD17B10 (0.50) | ALDH1A1HSD17B10CYP1A2CYP3A4CYP2D6 | |
| Dibenzyl Disulfide SCHEMBL1741790 | 0.88 | IDO1 (0.52) | ALDH1A1HSD17B10CYP1A2CYP3A4CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4690987-A | Activation energy-curable resin composition | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1987-09-01 | — | — | US | claimed |
| CN-118169970-A | Method for manufacturing semiconductor device and CMOS image sensor | 台湾积体电路制造股份有限公司 | 2024-06-11 | — | — | CN | disclosed |
| CN-113805435-B | Photoresist and method | 台湾积体电路制造股份有限公司 | 2024-05-28 | — | — | CN | disclosed |
| CN-110955112-B | Photoresist composition and method for forming photoresist pattern | 台湾积体电路制造股份有限公司 | 2024-04-26 | — | — | CN | disclosed |
| CN-111123643-B | Protective composition and method for forming photoresist pattern | 台湾积体电路制造股份有限公司 | 2023-11-07 | — | — | CN | disclosed |
| CN-113782499-A | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2021-12-10 | — | — | CN | disclosed |
| CN-104051380-B | Wiring system and technique | 台湾积体电路制造股份有限公司 | 2017-08-15 | — | — | CN | disclosed |
| US-9120252-B2 | Molded article and method for production thereof | KURARAY CO., LTD. (JP) | 2015-09-01 | — | — | US | disclosed |
| CN-102549500-B | Dry film photoresist | KOLON INC | 2014-04-30 | — | — | CN | disclosed |
| CN-102549499-B | Dry film photoresist | KOLON INC | 2013-09-11 | — | — | CN | disclosed |
| US-6760086-B2 | Attachment film for electronic display device | TOMOEGAWA PAPER CO., LTD. (JP) | 2004-07-06 | — | — | US | disclosed |
| US-20030089516-A1 | ATTACHMENT FILM FOR ELECTRONIC DISPLAY DEVICE | TOMOEGAWA PAPER CO., LTD. (JP) | 2003-05-15 | — | — | US | disclosed |
| CN-1384399-A | Photoresist composition | HIPRAY CORP (US) | 2002-12-11 | — | — | CN | disclosed |
| US-20020106446-A1 | PROCESS FOR FORMING A PATTERN OF FLUORESCENT SUBSTRATE AND PLASMA DISPLAY PANEL | BEHR SYSTEMS, INC. | 2002-08-08 | — | — | US | disclosed |
| US-6312860-B1 | INORGANIC PHOSPHOR, CAPABLE OF EMITTING BLUE COLOR UPON ULTRAVIOLET IRRADIATION, AND COPPER OR A COPPER COMPOUND; NO DETERIORATION IN THE BRIGHTNESS OR VARIATION IN THE COLORATION OF THE PHOSPHOR. | DAI NIPPON PRINTING CO., LTD. (JP) | 2001-11-06 | — | — | US | disclosed |
| CN-1270329-A | Optical imaging composition with improved chemical quality and stripping performance | SYPREY CORP (US) | 2000-10-18 | — | — | CN | disclosed |
| US-6106992-A | PHOTORESIST FILM COMPRISING BASE FILM, PHOTOSENSITIVE RESIN COMPOSITION LAYER COMPRISING A FLUORESCENT SUBSTANCE, A PHOTOSENSITIVE RESIN, AND A VOLATILE ORGANIC MATERIAL; USEFUL FOR PRODUCING FLUORESCENT SUBSTANCE DISPLAY | DAI NIPPON PRINTING CO., LTD. (JP) | 2000-08-22 | — | — | US | disclosed |
| US-6066431-A | SIMPLIFIED PROCESS FOR FORMING FLUORESCENT SUBSTANCE PATTERN FOR DISPLAY DEVICE WHICH ELIMINATES WET PROCESS DEVELOPING STEP | DAI NIPPON PRINTING CO., LTD. (JP) | 2000-05-23 | — | — | US | disclosed |
| CN-1245909-A | Optical imageable composite with improved flexibility | NICHIGO MORTON CO LTD (JP) | 2000-03-01 | — | — | CN | disclosed |
| US-4690987-A | Activation energy-curable resin composition | DAINIPPON INK AND CHEMICALS, INC. (JP) | 1987-09-01 | — | — | US | disclosed |