Alpha-Tocopherol

Alpha-Tocopherol

SCHEMBL16451007

Cc1c(C)c2c(c(C)c1O)CC[C@@](C)(CCC[C@@H](C)CCC[C@@H](C)CCCC(C)C)O2

nearest known ligand 1.00 ✓ in ChEMBL — recovers established targets

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 3/20 1.00
TTPA P49638 3/20 1.00
MAPT P10636 2/20 1.00
MEN1 O00255 2/20 1.00
KMT2A Q03164 2/20 1.00
GSTP1 P09211 1/20 1.00
USP2 O75604 1/20 1.00
THRB P10828 1/20 1.00
CYP2C9 P11712 1/20 1.00
CYP2C19 P33261 1/20 1.00
NR1I2 O75469 2/20 0.85
ALOX5 P09917 1/20 0.78
PDE4A P27815 1/20 0.70
PDE3A Q14432 1/20 0.70
GSTO1 P78417 2/20 0.69
PSEN1 P49768 2/20 0.67
PTPN1 P18031 1/20 0.64
AKT1 P31749 4/20 0.58
PDPK1 O15530 1/20 0.58
PHLPP1 O60346 1/20 0.58

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Alpha-Tocopherol SCHEMBL10295722 1.00 LMNA (1.00) LMNATTPAMAPTMEN1KMT2A
SCHEMBL8084077 1.00 LMNA (1.00) LMNATTPAMAPTMEN1KMT2A
Alpha-Tocopherol SCHEMBL8408151 1.00 LMNA (1.00) LMNATTPAMAPTMEN1KMT2A
Alpha-Tocopherol SCHEMBL14297170 1.00 LMNA (1.00) LMNATTPAMAPTMEN1KMT2A
Alpha-Tocopherol SCHEMBL17874901 1.00 LMNA (1.00) LMNATTPAMAPTMEN1KMT2A
Alpha-Tochopherol SCHEMBL14315133 1.00 LMNA (1.00) LMNATTPAMAPTMEN1KMT2A
Alpha-Tocopherol SCHEMBL14167439 1.00 LMNA (1.00) LMNATTPAMAPTMEN1KMT2A
Alpha-Tocopherol SCHEMBL3059188 1.00 LMNA (1.00) LMNATTPAMAPTMEN1KMT2A
Alpha-Tocopherol SCHEMBL20817063 1.00 LMNA (1.00) LMNATTPAMAPTMEN1KMT2A
SCHEMBL15441194 1.00 LMNA (1.00) LMNATTPAMAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9372403-B2 Chemically amplified photosensitive resin composition and method for producing resist pattern using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2016-06-21 US disclosed
US-9372403-B2 Chemically amplified photosensitive resin composition and method for producing resist pattern using the same TOKYO OHKA KOGYO CO., LTD. (JP) 2016-06-21 US disclosed
US-20150044613-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN USING THE SAME TOKYO OHKA KOGYO CO., LTD. (JP) 2015-02-12 US disclosed
US-20150044613-A1 CHEMICALLY AMPLIFIED PHOTOSENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN USING THE SAME TOKYO OHKA KOGYO CO., LTD. (JP) 2015-02-12 US disclosed