Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 1/20 | 0.88 |
| ▸ | TSHR | P16473 | 2/20 | 0.61 |
| ▸ | GAA | P10253 | 1/20 | 0.57 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.52 |
| ▸ | HSD11B1 | P28845 | 7/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | CES2 | O00748 | 1/20 | 0.44 |
| ▸ | CES1 | P23141 | 1/20 | 0.44 |
| ▸ | HSD11B2 | P80365 | 2/20 | 0.44 |
| ▸ | CNR1 | P21554 | 1/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1515238 | 0.98 | RECQL (0.83) | RECQLTSHRGAAALDH1A1HSD11B1 | |
| SCHEMBL16468180 | 0.93 | RECQL (1.00) | RECQLTSHRGAAALDH1A1HSD11B1 | |
| SCHEMBL24322396 | 0.84 | RECQL (0.69) | RECQLTSHRGAAALDH1A1HSD11B1 | |
| SCHEMBL9667146 | 0.77 | TSHR (0.96) | RECQLTSHRGAAALDH1A1HSD11B1 | |
| SCHEMBL9667551 | 0.74 | GAA (0.95) | RECQLTSHRGAAALDH1A1HSD11B1 | |
| SCHEMBL16254880 | 0.72 | TSHR (0.66) | RECQLTSHRGAAALDH1A1HSD11B1 | |
| SCHEMBL9093412 | 0.72 | TSHR (0.66) | RECQLTSHRGAAALDH1A1HSD11B1 | |
| SCHEMBL25824927 | 0.72 | RECQL (0.55) | RECQLTSHRGAAALDH1A1HSD11B1 | |
| SCHEMBL19386636 | 0.71 | RECQL (0.53) | RECQLTSHRGAAALDH1A1HSD11B1 | |
| SCHEMBL27209297 | 0.71 | RECQL (0.53) | RECQLTSHRGAAMAPTHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119955091-A | Polymer, positive-type negative-type photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protective film, and electronic component | 信越化学工业株式会社 | 2025-05-09 | — | — | CN | disclosed |
| CN-118210199-A | Photosensitive resin composition, cured film pattern, and method for producing same | 奇美实业股份有限公司 | 2024-06-18 | — | — | CN | disclosed |
| CN-115113484-A | Positive photosensitive resin composition, positive photosensitive dry film, method for producing the same, and method for forming pattern | 信越化学工业株式会社 | 2022-09-27 | — | — | CN | disclosed |
| CN-107561863-B | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2022-09-16 | — | — | CN | disclosed |
| CN-114253069-A | Photosensitive resin composition, pattern forming method, cured film forming method, interlayer insulating film, and surface protective film | 信越化学工业株式会社 | 2022-03-29 | — | — | CN | disclosed |
| US-10162260-B2 | Photosensitive resin composition, protective film, and liquid crystal display element | CHI MEI CORPORATION (TW) | 2018-12-25 | — | — | US | disclosed |
| CN-107561863-A | Positive photosensitive resin composition and application thereof | 奇美实业股份有限公司 | 2018-01-09 | — | — | CN | disclosed |
| CN-106909028-A | Photosensitive resin composition, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2017-06-30 | — | — | CN | disclosed |
| US-20170168390-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PROTECTIVE FILM, AND LIQUID CRYSTAL DISPLAY ELEMENT | CHI MEI CORPORATION (TW) | 2017-06-15 | — | — | US | disclosed |
| US-20150293449-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-10-15 | — | — | US | disclosed |
| CN-104950580-A | Photosensitive polysiloxane composition and application thereof | CHI MEI CORP | 2015-09-30 | — | — | CN | disclosed |
| CN-104375381-A | Photosensitive polysiloxane composition, film formed by photosensitive polysiloxane composition and device comprising film | CHI MEI CORP | 2015-02-25 | — | — | CN | disclosed |
| US-20150050596-A1 | PHOTOSENSITIVE POLYSILOXANE COMPOSITION AND USES THEREOF | CHI MEI CORPORATION (TW) | 2015-02-19 | — | — | US | disclosed |