SCHEMBL164714

SCHEMBL164714

C=COC(=O)C(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8045254 0.79
SCHEMBL480449 0.79
SCHEMBL28563059 0.75 ALDH1A1 (0.32)
SCHEMBL28515500 0.74
SCHEMBL907805 0.74 HTT (0.33)
SCHEMBL1087568 0.74
SCHEMBL8501336 0.72
SCHEMBL93534 0.72
SCHEMBL11046895 0.72
SCHEMBL10791985 0.72 TSHR (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1101 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9376523-B2 Poly(vinyl alcohol)-poly(vinyl ester) block copolymers WISCONSIN ALUMNI RESEARCH FOUNDATION (US) 2016-06-28 US claimed
US-20150307645-A1 POLY(VINYL ALCOHOL)-POLY(VINYL ESTER) BLOCK COPOLYMERS WISCONSIN ALUMNI RESEARCH FOUNDATION (US) 2015-10-29 US claimed
WO-2011115641-A1 POLY(VINYL ALCOHOL) -POLY(VINYL ESTER) BLOCK COPOLYMERS WISCONSIN ALUMNI RESEARCH FOUNDATION (US) 2011-09-22 WO claimed
WO-2011112911-A2 POLY(VINYL ESTER) BLOCK COPOLYMERS WISCONSIN ALUMNI RESEARCH FOUNDATION (US) 2011-09-15 WO claimed
US-20110224377-A1 POLY(VINYL ESTER) BLOCK COPOLYMERS WISCONSIN ALUMNI RESEARCH FOUNDATION 2011-09-15 US claimed
US-7105270-B2 Fluoroaliphatic group-containing copolymer FUJI PHOTO FILM CO., LTD. (JP) 2006-09-12 US claimed
US-5698361-A DIAZONIUM COMPOUND, POLYMERIC BINDER; DURABILITY FUJI PHOTO FILM CO., LTD. (JP) 1997-12-16 US claimed
US-4518754-A Imido copolymers RHONE-POULENC INDUSTRIES (FR) 1985-05-21 US claimed
US-4087574-A PHOTOGRAPHY, VINYL OR VINYLIDENE CHLORIDE POLYMERS FUJI PHOTO FILM CO., LTD. (JA) 1978-05-02 US claimed
EP-4743828-A1 PHOTOCURABLE AS WELL AS THERMALLY CURABLE COMPOSITIONS SUITABLE FOR LOW TEMPERATURE CURING BASF SE (DE) 2026-05-20 EP disclosed
CN-120118458-A Curable composition, resin, and cured product 东京应化工业株式会社 2025-06-10 CN disclosed
US-12312489-B2 Curable composition, cured product and method for forming insulating film TOKYO OHKA KOGYO CO., LTD. (JP) 2025-05-27 US disclosed
CN-120044752-A Photosensitive resin composition 东京应化工业株式会社 2025-05-27 CN disclosed
CN-120044751-A Photosensitive resin composition 东京应化工业株式会社 2025-05-27 CN disclosed
US-4006113-A Novel coating composition containing acetylene-conjugated diene random copolymers BRIDGESTONE TIRE COMPANY LIMITED (JA) 1977-02-01 US disclosed
US-3970608-A Epoxidized acetylene-conjugated diene random copolymer and the curable composition comprising the same BRIDGESTONE TIRE COMPANY LIMITED (JA) 1976-07-20 US disclosed
US-3963495-A Image-receiving element for silver salt diffusion transfer with layer of monoacrylates or monomethacrylates of polyhydric alcohols FUJI PHOTO FILM CO., LTD. (JA) 1976-06-15 US disclosed
US-3950247-A WATER, FORMALDEHYDE, POLYVINYL CHLORIDE MEMBRANES MONSANTO COMPANY (US) 1976-04-13 US disclosed
US-3936429-A Reactive polymer FUJI PHOTO FILM CO., LTD. (JA) 1976-02-03 US disclosed
US-3931248-A Reactive high polymer compound FUJI PHOTO FILM CO., LTD. (JA) 1976-01-06 US disclosed