Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.62 |
| ▸ | CYP1A2 | P05177 | 5/20 | 0.62 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.62 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.62 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.62 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.62 |
| ▸ | HPGD | P15428 | 1/20 | 0.62 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.62 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.62 |
| ▸ | CA1 | P00915 | 2/20 | 0.54 |
| ▸ | CA2 | P00918 | 2/20 | 0.54 |
| ▸ | MAPT | P10636 | 3/20 | 0.52 |
| ▸ | NPC1 | O15118 | 2/20 | 0.52 |
| ▸ | RAB9A | P51151 | 2/20 | 0.52 |
| ▸ | LMNA | P02545 | 3/20 | 0.52 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.52 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.52 |
| ▸ | GAA | P10253 | 2/20 | 0.52 |
| ▸ | HTT | P42858 | 1/20 | 0.52 |
| ▸ | MEN1 | O00255 | 3/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL80985 | 0.93 | ALDH1A1 (0.68) | ALDH1A1CYP1A2CYP3A4HSD17B10CYP2C19 | |
| SCHEMBL18643870 | 0.87 | CYP2A6 (0.58) | ALDH1A1CYP1A2CYP3A4HSD17B10CYP2C19 | |
| SCHEMBL28002593 | 0.87 | ALDH1A1 (0.58) | ALDH1A1CYP1A2CYP3A4HSD17B10CYP2C19 | |
| SCHEMBL28177210 | 0.87 | CYP2A6 (0.58) | ALDH1A1CYP1A2CYP3A4HSD17B10CYP2C19 | |
| SCHEMBL11665723 | 0.85 | MAPT (0.50) | ALDH1A1CYP1A2CYP3A4HSD17B10CYP2C19 | |
| SCHEMBL3739909 | 0.83 | ALDH1A1 (0.86) | ALDH1A1CYP1A2CYP3A4HSD17B10CYP2C19 | |
| SCHEMBL29386674 | 0.83 | ALDH1A1 (0.86) | ALDH1A1CYP1A2CYP3A4HSD17B10CYP2C19 | |
| SCHEMBL182655 | 0.83 | ALDH1A1 (0.86) | ALDH1A1CYP1A2CYP3A4HSD17B10CYP2C19 | |
| SCHEMBL4464619 | 0.82 | ALDH1A1 (0.48) | ALDH1A1CYP1A2CYP3A4HSD17B10CYP2C19 | |
| SCHEMBL29352988 | 0.81 | ALDH1A1 (0.91) | ALDH1A1CYP1A2CYP3A4HSD17B10CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 41 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3185345-B1 | REINFORCED COMPOSITE MEMBRANES AND METHOD FOR MANUFACTURING THE SAME | KOREA INST ENERGY RES (KR) | 2019-06-19 | — | — | EP | claimed |
| EP-3185345-A2 | REINFORCED COMPOSITE MEMBRANES AND METHOD FOR MANUFACTURING THE SAME | Korea Institute of Energy Research (KR) | 2017-06-28 | — | — | EP | claimed |
| US-20170179514-A1 | REINFORCED COMPOSITE MEMBRANES AND METHOD FOR MANUFACTURING THE SAME | KOREA INSTITUTE OF ENERGY RESEARCH (KR) | 2017-06-22 | — | — | US | claimed |
| US-12341017-B2 | Etching methods with alternating non-plasma and plasma etching processes | AMERICAN AIR LIQUIDE, INC. (US) | 2025-06-24 | — | — | US | disclosed |
| CN-119775473-A | Ultra-high temperature resistant perfluoroether rubber and preparation method thereof | 福建永泓高新材料有限公司 | 2025-04-08 | — | — | CN | disclosed |
| US-20240162042-A1 | ETCHING METHODS WITH ALTERNATING NON-PLASMA AND PLASMA ETCHING PROCESSES | AMERICAN AIR LIQUIDE, INC. | 2024-05-16 | — | — | US | disclosed |
| EP-3563406-B1 | IODINE-CONTAINING COMPOUNDS FOR ETCHING SEMICONDUCTOR STRUCTURES | AIR LIQUIDE (FR) | 2024-04-24 | — | — | EP | disclosed |
| CN-116884838-A | Iodine-containing compounds for etching semiconductor structures | 乔治洛德方法研究和开发液化空气有限公司 | 2023-10-13 | — | — | CN | disclosed |
| CN-110178206-B | Iodine-containing compounds for etching semiconductor structures | 乔治洛德方法研究和开发液化空气有限公司 | 2023-08-18 | — | — | CN | disclosed |
| WO-2022191429-A1 | METHOD FOR ETCHING MULTI-LAMINATE OF SILICON-CONTAINING FILMS, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, COMPRISING SAME | 에스케이 머티리얼즈 주식회사 | 2022-09-15 | — | — | WO | disclosed |
| US-11430663-B2 | Iodine-containing compounds for etching semiconductor structures | AMERICAN AIR LIQUIDE, INC. (US) | 2022-08-30 | — | — | US | disclosed |
| US-5858571-A | TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-01-12 | — | — | US | disclosed |
| EP-0872903-A1 | Method for making hydrogen storage alloy powder and electrode comprising the alloy powder | Shin-Etsu Chemical Co., Ltd. (JP) | 1998-10-21 | — | — | EP | disclosed |
| EP-0304239-B1 | Reformed polysilazane and method of producing same | TOA NENRYO KOGYO KK (JP) | 1995-04-19 | — | — | EP | disclosed |
| US-4975512-A | Crosslinking with amine, ammonium, hydrazine | PETROLEUM ENERGY CENTER (JP) | 1990-12-04 | — | — | US | disclosed |
| EP-0172427-B1 | PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER | Shin-Etsu Chemical Co., Ltd. (JP) | 1989-07-05 | — | — | EP | disclosed |
| EP-0304239-A1 | Reformed polysilazane and method of producing same | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1989-02-22 | — | — | EP | disclosed |
| US-4758639-A | Process for production of vinyl polymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-19 | — | — | US | disclosed |
| US-4757124-A | Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1988-07-12 | — | — | US | disclosed |
| EP-0172427-A2 | Process for production of vinyl chloride polymer | Shin-Etsu Chemical Co., Ltd. (JP) | 1986-02-26 | — | — | EP | disclosed |