Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | BLM | P54132 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | PGK1 | P00558 | 1/20 | 0.43 |
| ▸ | PGK2 | P07205 | 1/20 | 0.43 |
| ▸ | ENO1 | P06733 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | MMP2 | P08253 | 1/20 | 0.37 |
| ▸ | THRB | P10828 | 1/20 | 0.37 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | GRIN2D | O15399 | 1/20 | 0.35 |
| ▸ | GRIN3B | O60391 | 1/20 | 0.35 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.35 |
| ▸ | GRIN2A | Q12879 | 1/20 | 0.35 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL491391 | 0.76 | — | — | |
| SCHEMBL10882405 | 0.71 | — | — | |
| SCHEMBL144420 | 0.71 | — | — | |
| SCHEMBL5775798 | 0.71 | — | — | |
| SCHEMBL19211975 | 0.69 | MEN1 (0.38) | MEN1LMNAHPGDTSHRBLM | |
| SCHEMBL19211973 | 0.69 | MEN1 (0.38) | MEN1LMNAHPGDTSHRBLM | |
| SCHEMBL300621 | 0.69 | — | — | |
| SCHEMBL28642991 | 0.69 | — | — | |
| Fosfonet SCHEMBL347045 | 0.67 | MEN1 (0.82) | MEN1LMNAHPGDTSHRBLM | |
| SCHEMBL483074 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230109597-A1 | CLEANING COMPOSITION | FUJIMI INCORPORATED (JP) | 2023-04-06 | — | — | US | disclosed |
| US-20210395645-A1 | CLEANING LIQUID | FUJIFILM ELECTRONIC MATERIALS CO., LTD. (JP) | 2021-12-23 | — | — | US | disclosed |
| US-11203731-B2 | Composition for surface treatment and method of producing the same, surface treatment method, and method of producing semiconductor substrate | FUJIMI INCORPORATED (JP) | 2021-12-21 | — | — | US | disclosed |
| US-20210130735-A1 | COMPOSITION FOR SURFACE TREATMENT AND METHOD OF PRODUCING THE SAME, SURFACE TREATMENT METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE | FUJIMI INCORPORATED (JP) | 2021-05-06 | — | — | US | disclosed |
| US-10954479-B2 | Composition for surface treatment and surface treatment method using the same | FUJIMI INCORPORATED | 2021-03-23 | — | — | US | disclosed |
| WO-2020195343-A1 | CLEANING LIQUID | 富士フイルムエレクトロニクスマテリアルズ株式会社 | 2020-10-01 | — | — | WO | disclosed |
| US-20200308450-A1 | POLISHING COMPOSITION | FUJIMI INCORPORATED (JP) | 2020-10-01 | — | — | US | disclosed |
| WO-2019181269-A1 | GERMANIUM DISSOLUTION INHIBITOR | 株式会社フジミインコーポレーテッド | 2019-09-26 | — | — | WO | disclosed |
| US-20190241842-A1 | COMPOSITION FOR SURFACE TREATMENT AND SURFACE TREATMENT METHOD USING THE SAME | FUJIMI INCORPORATED (JP) | 2019-08-08 | — | — | US | disclosed |
| US-9845538-B2 | Etching agent, etching method and etching agent preparation liquid | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-12-19 | — | — | US | disclosed |
| US-9803161-B2 | Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2017-10-31 | — | — | US | disclosed |
| US-20160177457-A1 | ETCHING AGENT, ETCHING METHOD AND ETCHING AGENT PREPARATION LIQUID | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2016-06-23 | — | — | US | disclosed |
| US-20150140820-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 2015-05-21 | — | — | US | disclosed |
| EP-2843689-A1 | CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE | Wako Pure Chemical Industries, Ltd. (JP) | 2015-03-04 | — | — | EP | disclosed |