SCHEMBL5775798

SCHEMBL5775798

CC[C](C)P(=O)(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL483074 0.75
SCHEMBL10882405 0.73
SCHEMBL16527353 0.71 MEN1 (0.43)
SCHEMBL3989010 0.69
SCHEMBL16527469 0.69 MMP2 (0.39)
Butanone SCHEMBL8138236 0.69 ALDH1A1 (0.71)
SCHEMBL27521341 0.69
SCHEMBL17626577 0.67 KDM4E (0.57)
SCHEMBL3061460 0.67
SCHEMBL11449708 0.67 MMP1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230109597-A1 CLEANING COMPOSITION FUJIMI INCORPORATED (JP) 2023-04-06 US disclosed
US-10954479-B2 Composition for surface treatment and surface treatment method using the same FUJIMI INCORPORATED 2021-03-23 US disclosed
WO-2020195343-A1 CLEANING LIQUID 富士フイルムエレクトロニクスマテリアルズ株式会社 2020-10-01 WO disclosed
US-20200308450-A1 POLISHING COMPOSITION FUJIMI INCORPORATED (JP) 2020-10-01 US disclosed
CN-111132549-A Long-acting control agent for ectoparasites of animals 三井化学AGRO株式会社 2020-05-08 CN disclosed
WO-2019181269-A1 GERMANIUM DISSOLUTION INHIBITOR 株式会社フジミインコーポレーテッド 2019-09-26 WO disclosed
US-20190241842-A1 COMPOSITION FOR SURFACE TREATMENT AND SURFACE TREATMENT METHOD USING THE SAME FUJIMI INCORPORATED (JP) 2019-08-08 US disclosed
US-9845538-B2 Etching agent, etching method and etching agent preparation liquid WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2017-12-19 US disclosed
US-9803161-B2 Cleaning agent for semiconductor substrates and method for processing semiconductor substrate surface WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2017-10-31 US disclosed
US-20160177457-A1 ETCHING AGENT, ETCHING METHOD AND ETCHING AGENT PREPARATION LIQUID WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2016-06-23 US disclosed
US-20150140820-A1 CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 2015-05-21 US disclosed
EP-2843689-A1 CLEANING AGENT FOR SEMICONDUCTOR SUBSTRATES AND METHOD FOR PROCESSING SEMICONDUCTOR SUBSTRATE SURFACE Wako Pure Chemical Industries, Ltd. (JP) 2015-03-04 EP disclosed
US-20060084690-A1 Isoxazole derivatives MOMOSE YU 2006-04-20 US disclosed
US-7022725-B2 Isoxazole derivatives TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2006-04-04 US disclosed
EP-1227098-B1 TRIAZOLOPURINE DERIVATIVES, DRUG COMPOSITIONS CONTAINING THE SAME AND ADENOSINE A3 RECEPTOR AFFINITIVE AGENTS OTSUKA PHARMA CO LTD (JP) 2004-04-28 EP disclosed
US-20040048908-A1 Isoxazole derivatives TAKEDA PHARMACEUTICAL COMPANY LIMITED (JP) 2004-03-11 US disclosed
US-6686343-B1 Triazolopurine derivatives, pharmaceutical compositions containing the derivatives, and adenosine A3 receptor affinitive agents OTSUKA PHARMACEUTICAL FACTORY, INC. (JP) 2004-02-03 US disclosed
EP-1340749-A1 ISOXAZOLE DERIVATIVES Takeda Chemical Industries, Ltd. (JP) 2003-09-03 EP disclosed
EP-1227098-A1 TRIAZOLOPURINE DERIVATIVES, DRUG COMPOSITIONS CONTAINING THE SAME AND ADENOSINE A3 RECEPTOR AFFINITIVE AGENTS OTSUKA PHARMACEUTICAL FACTORY, INC. (JP) 2002-07-31 EP disclosed