SCHEMBL1658

SCHEMBL1658

CC(=O)NBr

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL571469 0.96
Sulfur Dioxide SCHEMBL10838367 0.89
SCHEMBL5754147 0.72
Acetone SCHEMBL28589505 0.70
SCHEMBL1276127 0.67
SCHEMBL2401765 0.67 KDM4E (0.54)
Acetohydroxamic Acid SCHEMBL14492 0.67
Diacetamide SCHEMBL97089 0.67
SCHEMBL20411614 0.67
SCHEMBL18510170 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3314 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12506011-B2 Methods for wet atomic layer etching of transition metal oxide dielectric materials TOKYO ELECTRON LIMITED (JP) 2025-12-23 US claimed
US-20250306468-A1 MULTIPATTERNING WITH CROSSLINKABLE OVERCOAT TOKYO ELECTRON LIMITED (JP) 2025-10-02 US claimed
US-20250201572-A1 METHODS FOR WET ATOMIC LAYER ETCHING OF TRANSITION METAL OXIDE DIELECTRIC MATERIALS TOKYO ELECTRON LIMITED (JP) 2025-06-19 US claimed
WO-2025128187-A1 METHODS FOR WET ATOMIC LAYER ETCHING OF TRANSITION METAL OXIDE DIELECTRIC MATERIALS TOKYO ELECTRON LIMITED (JP) 2025-06-19 WO claimed
WO-2025101248-A1 METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOTORESIST FILM STACK TOKYO ELECTRON LIMITED (JP) 2025-05-15 WO claimed
US-20250149335-A1 METHOD TO PATTERN A SEMICONDUCTOR SUBSTRATE USING A MULTILAYER PHOTORESIST FILM STACK TOKYO ELECTRON LIMITED (JP) 2025-05-08 US claimed
US-12280047-B2 Treatment of aneurysms GEORGIA STATE UNIVERSITY RESEARCH FOUNDATION, INC. (US) 2025-04-22 US claimed
WO-2025059054-A1 PROCESS FOR PREPARING (2S,4S,4'S,6S)-2-METHYL-6-(1-METHYL-1H-1,2,3-TRIAZOL-4-YL)-2',-(TRIELUOROMETHYL)-4',5'-DIHYDROSPIRO[PIPERIDINE-4,7'-THIENO [2,3-C] PYRAN] -4'-OL VERTEX PHARMACEUTICALS INCORPORATED (US) 2025-03-20 WO claimed
CN-119528788-A Method for breaking C-N bond and prepared carboglucosides and cyclic ether compounds 南开大学 2025-02-28 CN claimed
CN-111484534-B Process for producing 14-bromoanthracycline 日本迈科洛生物制药有限公司 2025-01-14 CN claimed
US-4120728-A ORGANIC SILVER SALT, CATALYTIC LIGHT-SENSITIVE SILVER HALIDE PREPARED IN SURFACTANT AND SOLVENT, REDUCING AGENT, BINDER FUJI PHOTO FILM CO., LTD. (JP) 1978-10-17 US claimed
US-4113591-A BROMINATION IN PRESENCE OF ULTRAVIOLET RADIATION, VISIBLE LIGHT, OR GAMMA RAYS GLAXO LABORATORIES LIMITED (GB) 1978-09-12 US claimed
US-4102884-A TREATING A 3,14-DIHYDROXY-CARDENOLIDE WITH OXYGEN AND N-BROMOACETAMIDE IN THE PRESENCE OF PLATINUM, THEN WITH ETHANEDITHIOL, RANEY NICKEL STEELE CHEMICALS CO. LTD. (CA) 1978-07-25 US claimed
US-4086251-A POLYPROPYLENE, POLYBUTYLENE WITH AN ANHYDRIDE STANDARD OIL COMPANY (INDIANA) (US) 1978-04-25 US claimed
US-4076539-A LIGHT SENSITIVE MATERIAL FUJI PHOTO FILM CO., LTD. (JA) 1978-02-28 US claimed
US-4032348-A METHOD FOR FORMING PHASE HOLOGRAMS FUJI PHOTO FILM CO., LTD. (JA) 1977-06-28 US claimed
US-3968095-A Photodegradable plastics containing an N-halo amide THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF AGRICULTURE (US) 1976-07-06 US claimed
US-3957493-A Thermodevelopable photographic material with N-haloacetamide FUJI PHOTO FILM CO., LTD. (JA) 1976-05-18 US claimed
US-3956113-A REACTION PRODUCT OF CYANIDE, POSITIVE HALOGEN, AND POLYHYDROXY COMPOUNDS MAX BRENNER, 33 SPIEGELBERGSTRASSE CH-4059 BASLES, (CH) 1976-05-11 US claimed
US-3948659-A BLEACHING FUJI PHOTO FILM CO., LTD. (JA) 1976-04-06 US claimed