Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGCR | P04035 | 2/20 | 0.34 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.30 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL802174 | 0.81 | MMP8 (0.34) | HMGCRCYP4F2CYP4A11 | |
| SCHEMBL13302408 | 0.76 | CYP4F2 (0.36) | HMGCRCYP4F2CYP4A11 | |
| SCHEMBL92362 | 0.76 | CYP4F2 (0.40) | HMGCRCYP4F2CYP4A11 | |
| SCHEMBL13823317 | 0.76 | HMGCR (0.36) | HMGCRCYP4F2CYP4A11 | |
| SCHEMBL5021627 | 0.75 | CYP4F2 (0.41) | HMGCRCYP4F2CYP4A11 | |
| SCHEMBL10204831 | 0.75 | HMGCR (0.35) | HMGCRCYP4F2CYP4A11 | |
| SCHEMBL25667376 | 0.74 | CYP4F2 (0.35) | HMGCRCYP4F2CYP4A11 | |
| SCHEMBL25519504 | 0.73 | HMGCR (0.30) | HMGCR | |
| SCHEMBL13563651 | 0.73 | CYP4F2 (0.34) | HMGCRCYP4F2CYP4A11 | |
| SCHEMBL47446 | 0.73 | CYP4F2 (0.34) | HMGCRCYP4F2CYP4A11 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11640113-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, and method of manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2023-05-02 | — | — | US | disclosed |
| US-20170121437-A1 | PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, ACTIVE-LIGHT-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND MASK BLANK | FUJIFILM CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |
| US-20160195814-A1 | PATTERN FORMATION METHOD, ELECTRONIC-DEVICE PRODUCTION METHOD, AND PROCESSING AGENT | FUJIFILM CORPORATION (JP) | 2016-07-07 | — | — | US | disclosed |
| US-20150086912-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM AND PATTERN FORMING METHOD USING THE SAME, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2015-03-26 | — | — | US | disclosed |