Acetonitrile

Acetonitrile

SCHEMBL166141

CC#N.CC(C)(C)P(C1CCCCC1)C1CCCCC1.CC(C)(C)P(C1CCCCC1)C1CCCCC1.[Pd]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3171223 0.89 — —
SCHEMBL301018 0.86 — —
SCHEMBL3180439 0.86 — —
SCHEMBL9990819 0.86 — —
SCHEMBL10905091 0.86 — —
SCHEMBL301090 0.86 — —
Hydrochloric Acid SCHEMBL17491838 0.84 — —
Acetic Acid SCHEMBL983718 0.84 — —
Hydrochloric Acid SCHEMBL22531839 0.84 — —
SCHEMBL301146 0.83 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9328179-B2 Water soluble norbornene-type polymers and photoimageable compositions thereof PROMERUS, LLC (US) 2016-05-03 — — US claimed
US-20140349233-A1 WATER SOLUBLE NORBORNENE-TYPE POLYMERS AND PHOTOIMAGEABLE COMPOSITIONS THEREOF SUMITOMO BAKELITE CO., LTD. (JP) 2014-11-27 — — US claimed
US-9647222-B2 Gate insulator layer for organic electronic devices MERCK PATENT GMBH (DE) 2017-05-09 — — US disclosed
US-9647213-B2 Interlayer for electronic devices MERCK PATENT GMBH (DE) 2017-05-09 — — US disclosed
US-9583713-B2 Interlayer for electronic devices MERCK PATENT GMBH (DE) 2017-02-28 — — US disclosed
EP-2676979-B1 Gate insulator layer for electronic devices MERCK PATENT GMBH (DE) 2016-07-13 — — EP disclosed
US-20150372246-A1 GATE INSULATOR LAYER FOR ORGANIC ELECTRONIC DEVICES FLEXENABLE TECHNOLOGY LIMITED (GB) 2015-12-24 — — US disclosed
US-20150349263-A1 INTERLAYER FOR ELECTRONIC DEVICES FLEXENABLE TECHNOLOGY LIMITED (GB) 2015-12-03 — — US disclosed
EP-2611842-B1 INTERLAYER FOR ELECTRONIC DEVICES MERCK PATENT GMBH (DE) 2015-11-04 — — EP disclosed
EP-2611841-B1 GATE INSULATOR LAYER FOR ELECTRONIC DEVICES MERCK PATENT GMBH (DE) 2015-10-28 — — EP disclosed
EP-2676978-B1 INTERLAYER FOR ELECTRONIC DEVICES MERCK PATENT GMBH (DE) 2015-06-24 — — EP disclosed
WO-2012028278-A1 INTERLAYER FOR ELECTRONIC DEVICES MERCK PATENT GMBH (DE) 2012-03-08 — — WO disclosed
US-20110065878-A1 Norbornene-Type Polymers, Compositions Thereof And Lithographic Processes Using Such Compositions PROMERUS LLC (US) 2011-03-17 — — US disclosed
US-7799883-B2 copolymerizing norbornene monomers containing ester groups, sulonamide groups, ethers, alcohols in presence of (Acetonitrile) bis(triisopropylphosphine)palladium(acetate) tetrakis (pentafluorophenyl)borate catalyst and an optional cocatalyst lithium tetrakis(pentafluorophenyl)borate diethyl etherate PROMERUS LLC (US) 2010-09-21 — — US disclosed
EP-2031007-A2 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions Promerus LLC (US) 2009-03-04 — — EP disclosed
EP-1853972-A2 NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS Promerus LLC (US) 2007-11-14 — — EP disclosed
US-20060234164-A1 copolymerizing norbornene monomers containing ester groups, sulonamide groups, ethers, alcohols in presence of (Acetonitrile) bis(triisopropylphosphine)palladium(acetate) tetrakis (pentafluorophenyl)borate catalyst and an optional cocatalyst lithium tetrakis(pentafluorophenyl)borate diethyl etherate PROMERUS LLC (US) 2006-10-19 — — US disclosed
US-20060235174-A1 Norbornene-type polymers, compositions thereof and lithographic processes using such compositions PROMERUS LLC (US) 2006-10-19 — — US disclosed
WO-2006091802-A2 NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS PROMERUS LLC (US) 2006-08-31 — — WO disclosed
WO-2006091523-A2 NORBORNENE-TYPE POLYMERS, COMPOSITIONS THEREOF AND LITHOGRAPHIC PROCESSES USING SUCH COMPOSITIONS PROMERUS LLC (US) 2006-08-31 — — WO disclosed
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