SCHEMBL3171223

SCHEMBL3171223

CC(C)(C)P(C1CCCCC1)C1CCCCC1.[Pd]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL301018 0.97 — —
SCHEMBL9990819 0.97 — —
SCHEMBL301090 0.97 — —
SCHEMBL3180439 0.97 — —
SCHEMBL10905091 0.97 — —
Hydrochloric Acid SCHEMBL22531839 0.94 — —
SCHEMBL301146 0.94 — —
Hydrochloric Acid SCHEMBL17491838 0.90 — —
Acetonitrile SCHEMBL166141 0.89 — —
SCHEMBL301250 0.88 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8084563-B2 Cyclic olefin addition copolymer, process for production thereof, and retardation film obtained from the copolymer JSR CORPORATION (JP) 2011-12-27 — — US disclosed
US-20100021707-A1 CYCLIC OLEFIN ADDITION COPOLYMER, METHOD FOR PRODUCING THE SAME, AND RETARDATION FILM OBTAINED FROM THE COPOLYMER JSR CORPORATION (JP) 2010-01-28 — — US disclosed
EP-2039708-A1 CYCLIC OLEFIN ADDITION COPOLYMER, METHOD FOR PRODUCING THE SAME, AND RETARDATION FILM OBTAINED FROM THE COPOLYMER JSR Corporation (JP) 2009-03-25 — — EP disclosed
US-7482412-B2 Process for manufacturing cycloolefin addition polymer JSR CORPORATION (JP) 2009-01-27 — — US disclosed
US-20080085979-A1 PROCESS FOR MANUFACTURING CYCLOOLEFIN ADDITION POLYMER JSR CORPORATION (JP) 2008-04-10 — — US disclosed
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