SCHEMBL16638365

SCHEMBL16638365

O=S(=O)(O)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)Oc1cccc2ccccc12

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.39
KDM4E B2RXH2 4/20 0.39
HSD17B10 Q99714 3/20 0.39
HPGD P15428 2/20 0.38
TDP1 Q9NUW8 1/20 0.38
HTT P42858 1/20 0.37
PGR P06401 1/20 0.37
GAA P10253 1/20 0.37
PTGS1 P23219 1/20 0.37
MAPK1 P28482 1/20 0.37
HTR1B P28222 2/20 0.36
KMT2A Q03164 4/20 0.36
MEN1 O00255 3/20 0.36
RAB9A P51151 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
NR2E1 Q9Y466 1/20 0.35
RORA P35398 1/20 0.35
RORC P51449 1/20 0.35
NR1H2 P55055 1/20 0.35
NR1H4 Q96RI1 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31299571 0.85 CA1 (0.39) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL16638366 0.81 MCL1 (0.38) ALDH1A1KDM4EHSD17B10HPGDHTT
SCHEMBL10083980 0.81 ALDH1A1 (0.47) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL9966116 0.81 SLC2A1 (0.34) SLC2A1
SCHEMBL29937164 0.80 ALDH1A1 (0.46) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL1056365 0.80 ALDH1A1 (0.46) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL15450682 0.79 CDC25B (0.40) KMT2AMEN1L3MBTL1MCL1
Hydrogen Sulfide SCHEMBL27507715 0.79 ALDH1A1 (0.45) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL10083982 0.78 ALDH1A1 (0.49) ALDH1A1KDM4EHSD17B10HPGDTDP1
SCHEMBL2742165 0.78 CAPN1 (0.30) HPGDKMT2AMEN1SLC2A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9005870-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-04-14 US disclosed