SCHEMBL1664428

SCHEMBL1664428

[c]1[c]cc2c([c]1)Nc1ccccc1O2

nearest known ligand 0.53

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALOX5 P09917 11/20 0.53
HTR2B P41595 2/20 0.38
HTR7 P34969 1/20 0.38
GAA P10253 1/20 0.36
NPSR1 Q6W5P4 1/20 0.36
DHODH Q02127 1/20 0.36
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
MAPT P10636 3/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
ALDH1A1 P00352 1/20 0.33
POLB P06746 1/20 0.33
LMNA P02545 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL851887 0.77 ALOX5 (0.55) ALOX5HTR2BHTR7GAANPSR1
Phenoxazine SCHEMBL28844098 0.72 ALOX5 (1.00) ALOX5HTR2BHTR7GAANPSR1
Phenoxazine SCHEMBL7862 0.72 ALOX5 (1.00) ALOX5HTR2BHTR7GAANPSR1
Phenoxazine SCHEMBL6310178 0.72 ALOX5 (1.00) ALOX5HTR2BHTR7GAANPSR1
Phenoxazine SCHEMBL29355714 0.72 ALOX5 (1.00) ALOX5HTR2BHTR7GAANPSR1
Phenoxazine SCHEMBL25275195 0.70 ALOX5 (0.94) ALOX5HTR2BHTR7GAANPSR1
Phenoxazine SCHEMBL5808288 0.70 ALOX5 (0.94) ALOX5HTR2BHTR7GAANPSR1
Phenoxazine SCHEMBL20840431 0.70 ALOX5 (0.94) ALOX5HTR2BHTR7GAANPSR1
Phenoxazine SCHEMBL29212121 0.70 ALOX5 (0.94) ALOX5HTR2BHTR7GAANPSR1
Phenoxazine SCHEMBL31267446 0.70 ALOX5 (0.94) ALOX5HTR2BHTR7GAANPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023013697-A1 MATERIAL FOR METAL PATTERNING, FLUORO COMPOUND, THIN FILM FOR METAL PATTERNING, ORGANIC ELECTROLUMINESCENCE DEVICE, ELECTRONIC DEVICE, AND METHOD FOR FORMING METAL PATTERN 東ソー株式会社 2023-02-09 WO disclosed
EP-2767407-B1 Ink-jet recording method and device FUJIFILM CORP (JP) 2015-12-02 EP disclosed
US-8888246-B2 Inkjet recording method and inkjet recording device FUJIFILM CORPORATION (JP) 2014-11-18 US disclosed
EP-2311918-B1 Ink composition, and inkjet recording method FUJIFILM CORP (JP) 2014-10-22 EP disclosed
US-20140232790-A1 INKJET RECORDING METHOD AND INKJET RECORDING DEVICE FUJIFILM CORPORATION (JP) 2014-08-21 US disclosed
EP-2767407-A1 Ink-jet recording method and device FUJIFILM Corporation (JP) 2014-08-20 EP disclosed
US-8211508-B2 radiation curing ink cures with high sensitivity to form a high quality, durable image resistant to cracking, peeling and has excellent impact resistance, flexibility, and adhesion; cyclic monofunctional acrylic or N-vinyl monomers FUJIFILM CORPORATION (JP) 2012-07-03 US disclosed
EP-2311918-A1 Ink composition, and inkjet recording method FUJIFILM Corporation (JP) 2011-04-20 EP disclosed
US-20080075882-A1 PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL, AND MOLDED PRINTED MATERIAL FUJIFILM CORPORATION (JP) 2008-03-27 US disclosed