Styrene

Styrene

SCHEMBL16660458

C=C(C)C(=O)Oc1ccc(O)cc1.C=Cc1ccccc1

nearest known ligand 0.57

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 4/20 0.57
KMT2A Q03164 6/20 0.43
ATM Q13315 2/20 0.43
ALDH1A1 P00352 2/20 0.41
TSHR P16473 1/20 0.41
GAA P10253 2/20 0.38
P4HB P07237 1/20 0.38
HTT P42858 1/20 0.38
LTA4H P09960 1/20 0.37
NR1H2 P55055 1/20 0.37
BAX Q07812 1/20 0.37
MAPT P10636 4/20 0.36
MEN1 O00255 2/20 0.36
ALDH2 P05091 1/20 0.36
CYP3A4 P08684 1/20 0.36
HSPD1 P10809 1/20 0.36
CYP19A1 P11511 1/20 0.36
F3 P13726 1/20 0.36
MAOA P21397 1/20 0.36
MAOB P27338 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL8073704 0.94 ELANE (0.64) ELANEKMT2AATMALDH1A1TSHR
4-Vinylphenol SCHEMBL15157512 0.92 ELANE (0.50) ELANEKMT2AATMALDH1A1P4HB
Styrene SCHEMBL28234664 0.91 ELANE (0.59) ELANEKMT2AATMALDH1A1TSHR
Styrene SCHEMBL544781 0.91 ELANE (0.59) ELANEKMT2AATMALDH1A1TSHR
Styrene SCHEMBL8997402 0.88 ELANE (0.57) ELANEKMT2AATMALDH1A1TSHR
Styrene SCHEMBL209287 0.88 ELANE (0.56) ELANEKMT2AATMALDH1A1TSHR
Styrene SCHEMBL28876378 0.87 ELANE (0.42) ELANEKMT2AATMALDH1A1TSHR
Styrene SCHEMBL9999408 0.86 ELANE (0.44) ELANEKMT2AATMALDH1A1TSHR
SCHEMBL5831972 0.86 ELANE (0.56) ELANEKMT2AATMALDH1A1HTT
SCHEMBL16660449 0.85 ELANE (0.48) ELANEKMT2AATMALDH1A1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9017918-B2 Monomer, polymer, chemically amplified positive resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-04-28 US disclosed