SCHEMBL16668253

SCHEMBL16668253

CCO[SiH2]N(CC)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19984961 0.73
SCHEMBL10709987 0.71
SCHEMBL19973288 0.69
SCHEMBL8650722 0.68
SCHEMBL28234103 0.67
SCHEMBL19973257 0.65
SCHEMBL31345775 0.65
SCHEMBL16668175 0.65 LMNA (0.30)
SCHEMBL19973249 0.65
SCHEMBL28235051 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-102574875-A Process for production of silane coupling agents BRIDGESTONE CORP 2012-07-11 CN claimed
EP-3020738-A9 CATALYST AND CATALYST COMPONENT THEREOF Toho Titanium Co., Ltd. (JP) 2017-03-15 EP disclosed
US-9425038-B2 Method and apparatus for forming silicon oxycarbonitride film, silicon oxycarbide film and silicon oxynitride film TOKYO ELECTRON LIMITED (JP) 2016-08-23 US disclosed
EP-3020738-A2 CATALYST AND CATALYST COMPONENT THEREOF Toho Titanium Co., Ltd. (JP) 2016-05-18 EP disclosed
US-20150118865-A1 METHOD AND APPARATUS FOR FORMING SILICON OXYCARBONITRIDE FILM, SILICON OXYCARBIDE FILM AND SILICON OXYNITRIDE FILM TOKYO ELECTRON LIMITED (JP) 2015-04-30 US disclosed
CN-102574875-A Process for production of silane coupling agents BRIDGESTONE CORP 2012-07-11 CN disclosed