SCHEMBL16668696

SCHEMBL16668696

CCO[SiH](C)CCN(C(C)C)C(C)C

nearest known ligand 0.36

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 1/20 0.36
KMT2A Q03164 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27817537 0.80 MEN1 (0.37) MEN1KMT2A
SCHEMBL16668644 0.73 MEN1 (0.30) MEN1KMT2A
SCHEMBL10308294 0.72
SCHEMBL27944903 0.71 MEN1 (0.46) MEN1KMT2A
SCHEMBL12898516 0.68
SCHEMBL2769579 0.68
SCHEMBL27925638 0.67 MEN1 (0.42) MEN1KMT2A
Water SCHEMBL28106022 0.66
Ammonia Solution, Strong SCHEMBL28118142 0.66
SCHEMBL27817396 0.65 MEN1 (0.40) MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9425038-B2 Method and apparatus for forming silicon oxycarbonitride film, silicon oxycarbide film and silicon oxynitride film TOKYO ELECTRON LIMITED (JP) 2016-08-23 US disclosed
US-20150118865-A1 METHOD AND APPARATUS FOR FORMING SILICON OXYCARBONITRIDE FILM, SILICON OXYCARBIDE FILM AND SILICON OXYNITRIDE FILM TOKYO ELECTRON LIMITED (JP) 2015-04-30 US disclosed